SCHEMBL489616

SCHEMBL489616

CC(=CC(O)CCCCO)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 4/20 0.35
FFAR1 O14842 3/20 0.35
FFAR4 Q5NUL3 2/20 0.35
PTPN1 P18031 1/20 0.33
CAMK2A Q9UQM7 1/20 0.33
ACHE P22303 1/20 0.33
BACE1 P56817 1/20 0.33
FNTA P49354 1/20 0.32
FNTB P49356 1/20 0.32
TRPA1 O75762 1/20 0.32
DDAH1 O94760 1/20 0.32
GAPDH P04406 1/20 0.32
MAPT P10636 1/20 0.32
KDM4E B2RXH2 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
PPARG P37231 2/20 0.30
GPR132 Q9UNW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2317783 0.98 GPR84 (0.39) GPR84FFAR1FFAR4PTPN1CAMK2A
SCHEMBL230415 0.98 GPR84 (0.39) GPR84FFAR1FFAR4PTPN1CAMK2A
SCHEMBL993417 0.98 GPR84 (0.39) GPR84FFAR1FFAR4PTPN1CAMK2A
SCHEMBL9742958 0.98 GPR84 (0.39) GPR84FFAR1FFAR4PTPN1CAMK2A
SCHEMBL175947 0.98 GPR84 (0.39) GPR84FFAR1FFAR4PTPN1CAMK2A
SCHEMBL2310879 0.98 GPR84 (0.39) GPR84FFAR1FFAR4PTPN1CAMK2A
SCHEMBL233228 0.94 CAMK2A (0.34) GPR84FFAR1FFAR4PTPN1CAMK2A
Methacrylic Acid SCHEMBL5847656 0.92 GPR84 (0.34) GPR84FFAR1FFAR4PTPN1FNTA
Methacrylic Acid SCHEMBL22572665 0.92 GPR84 (0.34) GPR84FFAR1FFAR4PTPN1FNTA
Methacrylic Acid SCHEMBL22572622 0.92 GPR84 (0.34) GPR84FFAR1FFAR4PTPN1FNTA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3374357-B1 DISUBSTITUTED DIARYLOXYBENZOHETERODIAZOLE COMPOUNDS ENI SPA (IT) 2019-10-02 EP claimed
EP-3004200-A1 METHOD FOR PRODUCING URETHANE (METH)ACRYLATES BASF SE (DE) 2016-04-13 EP claimed
EP-3004199-A1 METHOD FOR PRODUCING URETHANE (METH)ACRYLATES BASF SE (DE) 2016-04-13 EP claimed
WO-2014191228-A1 METHOD FOR PRODUCING URETHANE (METH)ACRYLATES BASF SE (DE) 2014-12-04 WO claimed
WO-2014191235-A1 METHOD FOR PRODUCING URETHANE (METH)ACRYLATES BASF SE (DE) 2014-12-04 WO claimed
EP-2421905-A1 RADIATION CURABLE COATING COMPOSITIONS BASF SE (DE) 2012-02-29 EP claimed
WO-2010121978-A1 RADIATION CURABLE COATING COMPOSITIONS BASF SE (DE) 2010-10-28 WO claimed
EP-2160429-A1 FLEXIBLE RADIATION-CURABLE COATING MASSES BASF SE (DE) 2010-03-10 EP claimed
EP-2089445-A1 RADIATION-CURABLE COMPOUNDS BASF SE (DE) 2009-08-19 EP claimed
EP-2089444-A1 RADIATION-CURABLE COMPOUNDS BASF SE (DE) 2009-08-19 EP claimed
WO-2008155352-A1 FLEXIBLE RADIATION-CURABLE COATING MASSES BASF SE (DE) 2008-12-24 WO claimed
WO-2008148739-A1 METHOD FOR THE PRODUCTION OF WATER-EMULSIFIABLE POLYURETHANE ACRYLATES BASF SE (DE) 2008-12-11 WO claimed
EP-1984417-A2 COATINGS REPARABLE BY ENERGY DISCHARGE BASF SE (DE) 2008-10-29 EP claimed
WO-2008043722-A1 RADIATION-CURABLE COMPOUNDS BASF SE (DE) 2008-04-17 WO claimed
WO-2008043723-A1 RADIATION-CURABLE COMPOUNDS BASF SE (DE) 2008-04-17 WO claimed
EP-1869098-A1 RADIATION-HARDENABLE COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 2007-12-26 EP claimed
WO-2007088126-A2 COATINGS REPARABLE BY ENERGY DISCHARGE BASF SE (DE) 2007-08-09 WO claimed
WO-2006103228-A1 RADIATION-HARDENABLE COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 2006-10-05 WO claimed
EP-3235842-B2 SELF-REPAIRING POLYURETHANE RESIN MATERIAL, SELF-REPAIRING POLYURETHANE RESIN, SELF-REPAIRING COATING MATERIAL, SELF-REPAIRING ELASTOMER MATERIAL, METHOD FOR PRODUCING SELF-REPAIRING POLYURETHANE RESIN MATERIAL, AND METHOD FOR PRODUCING SELF-REPAIRING POLYURETHANE RESIN MITSUI CHEMICALS INC (JP) 2023-10-11 EP disclosed
US-20050123781-A1 One-component flexible etch resistant clearcoat NIPPON PAINT (USA), INC. 2005-06-09 US disclosed