Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.61 |
| ▸ | TSHR | P16473 | 2/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.56 |
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | APP | P05067 | 4/20 | 0.31 |
| ▸ | USP2 | O75604 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CASP1 | P29466 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.31 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetraethylene Glycol SCHEMBL10428027 | 1.00 | MEN1 (0.61) | MEN1KMT2ATSHRMAPK1THRB | |
| Di(Hydroxyethyl)Ether SCHEMBL81016 | 0.97 | TSHR (0.59) | MEN1KMT2ATSHRMAPK1THRB | |
| Di(Hydroxyethyl)Ether SCHEMBL9183213 | 0.92 | TSHR (0.53) | MEN1KMT2ATSHRMAPK1THRB | |
| Triethylene Glycol SCHEMBL597360 | 0.89 | MEN1 (0.48) | MEN1KMT2ATSHRMAPK1THRB | |
| Di(Hydroxyethyl)Ether SCHEMBL20398410 | 0.85 | ALDH1A1 (0.56) | MEN1KMT2ATSHRMAPK1THRB | |
| Tetraethylene Glycol SCHEMBL10409635 | 0.83 | MEN1 (0.61) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL1401412 | 0.83 | ALDH1A1 (0.50) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL1401682 | 0.83 | ALDH1A1 (0.50) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL10389811 | 0.81 | MEN1 (0.58) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL81017 | 0.81 | MEN1 (0.58) | MEN1KMT2ATSHRMAPK1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119591780-A | Photoresist additive and photoresist composition | 合肥鼎材科技有限公司 | 2025-03-11 | — | — | CN | claimed |
| CN-108535971-B | Stripping liquid composition for removing photoresist | 易案爱富科技有限公司 | 2023-09-12 | — | — | CN | claimed |
| CN-114644740-A | Fluorine-containing phenolic resin, preparation method thereof and photoresist composition adopting fluorine-containing phenolic resin | 合肥鼎材科技有限公司 | 2022-06-21 | — | — | CN | claimed |
| CN-113087843-A | Polymer and photoresist composition containing same | 北京鼎材科技有限公司 | 2021-07-09 | — | — | CN | claimed |
| CN-120092052-A | Curable resin composition | 信越化学工业株式会社 | 2025-06-03 | — | — | CN | disclosed |
| CN-119654581-A | Ink composition, method for producing ink composition, and method for producing color filter | 信越化学工业株式会社 | 2025-03-18 | — | — | CN | disclosed |
| CN-119591780-A | Photoresist additive and photoresist composition | 合肥鼎材科技有限公司 | 2025-03-11 | — | — | CN | disclosed |
| CN-113087843-B | Polymer and photoresist composition containing same | 北京鼎材科技有限公司 | 2023-10-13 | — | — | CN | disclosed |
| CN-108535971-B | Stripping liquid composition for removing photoresist | 易案爱富科技有限公司 | 2023-09-12 | — | — | CN | disclosed |
| CN-109960109-B | Dispersing agent, photosensitive resin composition and application of dispersing agent and photosensitive resin composition | 北京鼎材科技有限公司 | 2023-08-29 | — | — | CN | disclosed |
| CN-116648671-A | Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index | 株式会社东进世美肯 | 2023-08-25 | — | — | CN | disclosed |
| CN-115703871-A | Phenolic resin and preparation method and application thereof | 合肥鼎材科技有限公司 | 2023-02-17 | — | — | CN | disclosed |
| CN-100407494-C | Sealing agent for photoelectric conversion element and photoelectric conversion element using the same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2008-07-30 | — | — | CN | disclosed |
| US-7101596-B2 | Liquid crystal sealant, liquid crystal display device using the same and method for producing the device | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2006-09-05 | — | — | US | disclosed |
| EP-1674919-A1 | SEALANT FOR LIQUID CRYSTAL, LIQUID-CRYSTAL DISPLAY MADE WITH THE SAME, AND PROCESS FOR PRODUICNG THE DISPLAY | Nippon Kayaku Kabushiki Kaisha (JP) | 2006-06-28 | — | — | EP | disclosed |
| CN-1751410-A | Sealing agent for photoelectric conversion element and photoelectric conversion element using the same | NIPPON KAYAKU KK (JP) | 2006-03-22 | — | — | CN | disclosed |
| US-20050181145-A1 | Liquid crystal sealant, liquid crystal display device using the same and method for producing the device | SHARP KABUSHIKI KAISHA (JP) | 2005-08-18 | — | — | US | disclosed |
| US-6120858-A | COMPRISING AN EPOXY RESIN, A NOVOLAC RESIN, A CURING ACCELERATOR AND A TITANIUM BLACK PIGMENT | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2000-09-19 | — | — | US | disclosed |
| US-4946620-A | DIETHYLENE GLYCOL DIALKYL ETHER AND POLYETHYLENE GLYCOL DIALKYL ETHER | NIPPON SHOKUBAI KAGAKU KOGYO CO., LTD. (JP) | 1990-08-07 | — | — | US | disclosed |
| EP-0315468-A1 | Acid gas absorbent composition | UNION CARBIDE CHEMICALS AND PLASTICS COMPANY, INC. (US) | 1989-05-10 | — | — | EP | disclosed |