Di(Hydroxyethyl)Ether

Di(Hydroxyethyl)Ether

SCHEMBL81016

CC(C)(C)OC(C)(C)C.OCCOCCO

nearest known ligand 0.59

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.59
MAPK1 P28482 1/20 0.59
MEN1 O00255 2/20 0.56
KMT2A Q03164 2/20 0.56
ALDH1A1 P00352 2/20 0.48
THRB P10828 1/20 0.42
HTT P42858 1/20 0.42
MAPT P10636 1/20 0.42
CYP4F2 P78329 1/20 0.31
CYP4A11 Q02928 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Triethylene Glycol SCHEMBL4899446 0.97 MEN1 (0.61) TSHRMAPK1MEN1KMT2AALDH1A1
Tetraethylene Glycol SCHEMBL10428027 0.97 MEN1 (0.61) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL9183213 0.95 TSHR (0.53) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL20398410 0.88 ALDH1A1 (0.56) TSHRMAPK1MEN1KMT2AALDH1A1
Triethylene Glycol SCHEMBL597360 0.86 MEN1 (0.48) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL2822048 0.82 TSHR (0.59) TSHRMAPK1MEN1KMT2AALDH1A1
Ethylene Glycol SCHEMBL231666 0.81 TSHR (0.39) TSHRMAPK1ALDH1A1
Tetraethylene Glycol SCHEMBL10409635 0.80 MEN1 (0.61) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL15253394 0.79 TSHR (0.62) TSHRMAPK1MEN1KMT2AALDH1A1
SCHEMBL81017 0.78 MEN1 (0.58) TSHRMAPK1MEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 688 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250344696-A1 ACIDIC BIOFILM REMEDIATION ECOLAB USA INC (US) 2025-11-13 US claimed
US-20250297194-A1 CLEANING METHOD OF SEMICONDUCTOR DEVICE, CLEANING APPARATUS OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR CLEANING COMPOSITION DAXIN MATERIALS CORPORATION (TW) 2025-09-25 US claimed
EP-4621829-A1 CLEANING METHOD OF SEMICONDUCTOR DEVICE, CLEANING APPARATUS OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR CLEANING COMPOSITION Daxin Materials Corporation (TW) 2025-09-24 EP claimed
US-12396456-B2 Acidic biofilm remediation ECOLAB USA INC. (US) 2025-08-26 US claimed
US-12312300-B2 Process for recovering close boiling products LANZATECH, INC. (US) 2025-05-27 US claimed
CN-113260922-B Positive photosensitive resin composition 株式会社东进世美肯 2025-02-25 CN claimed
CN-119497510-A Light emitting element, ink composition, and display device including light emitting element 三星显示有限公司 2025-02-21 CN claimed
US-20250063885-A1 LIGHT EMITTING ELEMENT, INK COMPOSITION AND DISPLAY DEVICE INCLUDING THE LIGHT EMITTING ELEMENT SAMSUNG DISPLAY CO., LTD. (KR) 2025-02-20 US claimed
CN-110967927-B Photosensitive resin composition and display device including the same 三星显示有限公司 2025-01-28 CN claimed
CN-116437917-B Deuterated derivative of ATX inhibitor and application thereof 西藏海思科制药有限公司 2024-12-13 CN claimed
CN-108998296-A A kind of high-flash agent for carbon hydrogen detergent and preparation method thereof that removal gap is dirty 深圳市港联化工有限公司 2018-12-14 CN claimed
EP-2937918-B1 HINDERED GLYMES FOR ELECTROLYTE COMPOSITIONS FUNDACION CENTRO DE INVESTIG COOPERATIVA DE ENERGIAS ALTERNATIVAS CIC ENERGIGUNE FUNDAZIOA (ES) 2018-10-24 EP claimed
US-10085447-B2 Acidic biofilm remediation ECOLAB USA INC. (US) 2018-10-02 US claimed
EP-2937918-A1 HINDERED GLYMES FOR ELECTROLYTE COMPOSITIONS CIC Energigune (ES) 2015-10-28 EP claimed
US-20140240645-A1 PHOTOSENSITIVE RESIN COMPOSITION, DISPLAY DEVICE USING THE SAME AND METHOD OF MANUFACTURING THE DISPLAY DEVICE SAMSUNG DISPLAY CO., LTD. (KR) 2014-08-28 US claimed
US-20120232153-A1 ACIDIC BIOFILM REMEDIATION ECOLAB USA INC. (US) 2012-09-13 US claimed
WO-2004107053-A1 POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING ADMS TECHNOLOGY CO., LTD. (KR) 2004-12-09 WO claimed
WO-2004107052-A1 NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING ADMS TECHNOLOGY CO., LTD. (KR) 2004-12-09 WO claimed
WO-2004097522-A1 NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD ADMS TECHNOLOGY CO. LTD. (KR) 2004-11-11 WO claimed
US-4027512-A Lubricant-coolant emulsion additive for metal working operations THE DOW CHEMICAL COMPANY (US) 1977-06-07 US claimed