⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4906434 | 0.78 | — | — | |
| SCHEMBL18294094 | 0.73 | OPRM1 (0.31) | — | |
| SCHEMBL4909910 | 0.71 | — | — | |
| SCHEMBL642795 | 0.71 | — | — | |
| SCHEMBL1405828 | 0.70 | — | — | |
| SCHEMBL15256879 | 0.70 | — | — | |
| SCHEMBL4177337 | 0.68 | — | — | |
| SCHEMBL2812245 | 0.68 | SGMS1 (0.35) | — | |
| SCHEMBL4173375 | 0.68 | — | — | |
| SCHEMBL30363180 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3281933-B1 | (METH)ACRYLATE MANUFACTURING METHOD | TOAGOSEI CO LTD (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-10266476-B2 | (Meth)acrylate manufacturing method | TOAGOSEI CO., LTD. (JP) | 2019-04-23 | — | — | US | disclosed |
| US-10065916-B2 | Method for producing (meth)acrylate | TOAGOSEI CO., LTD (JP) | 2018-09-04 | — | — | US | disclosed |
| US-20180118658-A1 | (METH)ACRYLATE MANUFACTURING METHOD | TOAGOSEI CO., LTD. (JP) | 2018-05-03 | — | — | US | disclosed |
| US-20180105483-A1 | METHOD FOR PRODUCING (METH)ACRYLATE | TOAGOSEI CO., LTD. (JP) | 2018-04-19 | — | — | US | disclosed |
| EP-3281933-A1 | (METH)ACRYLATE MANUFACTURING METHOD | Toagosei Co., Ltd. (JP) | 2018-02-14 | — | — | EP | disclosed |
| EP-3269700-A1 | METHOD FOR PRODUCING (METH)ACRYLATE | Toagosei Co., Ltd. (JP) | 2018-01-17 | — | — | EP | disclosed |
| US-20080318075-A1 | Photocurable Resin Composition | HITACHI CHEMICAL CO., LTD. (JP) | 2008-12-25 | — | — | US | disclosed |