⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1405828 | 0.80 | — | — | |
| SCHEMBL30363180 | 0.80 | — | — | |
| SCHEMBL4177337 | 0.78 | — | — | |
| SCHEMBL4173375 | 0.78 | — | — | |
| SCHEMBL7613359 | 0.76 | — | — | |
| SCHEMBL4909910 | 0.74 | — | — | |
| SCHEMBL2812245 | 0.74 | SGMS1 (0.35) | — | |
| SCHEMBL3056385 | 0.73 | — | — | |
| SCHEMBL4901995 | 0.71 | — | — | |
| SCHEMBL18294094 | 0.71 | OPRM1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240043361-A1 | ACETAL COMPOUND, ADDITIVE INCLUDING THE COMPOUND, AND RESIST COMPOSITION INCLUDING THE COMPOUND | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2024-02-08 | — | — | US | disclosed |
| US-9023982-B2 | Method for purifying resin for photolithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20140155564-A1 | METHOD FOR PURIFYING RESIN FOR PHOTOLITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-06-05 | — | — | US | disclosed |
| US-8455596-B2 | Method for producing a copolymer for photoresist | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-06-04 | — | — | US | disclosed |
| US-8119321-B2 | Resist polymer solution and process for producing the same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-02-21 | — | — | US | disclosed |
| US-7910282-B2 | From a monomer having a hydroxyl group and a monomer having no hydroxyl group, hydroxyl group-containing repeating unit in a low molecular weight region is controlled; improving a resist pattern shape | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-03-22 | — | — | US | disclosed |
| US-20100324245-A1 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PRODUCING METHOD THEREOF, AND COMPOSITION | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7838606-B2 | Production process of copolymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-11-23 | — | — | US | disclosed |
| US-20100222526-A1 | METHOD FOR PRODUCING A COPOLYMER FOR PHOTORESIST | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100216959-A1 | PROCESS FOR PRODUCTION OF PHOTORESIST RESINS | JSR CORPORATION (JP) | 2010-08-26 | — | — | US | disclosed |
| US-20080114139-A1 | Copolymer For Semiconductor Lithography And Producing Method Thereof, And Composition | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2008-05-15 | — | — | US | disclosed |
| US-7342087-B2 | Method for prevention of increase in particles in copolymer for semiconductor resist | MARUZEN PETROCHEMICAL CO. LTD. (JP) | 2008-03-11 | — | — | US | disclosed |
| US-20070161764-A1 | Novel thiol compound, copolymer and method for producing the copolymer | YAMAGISHI TAKANORI | 2007-07-12 | — | — | US | disclosed |
| US-20070111137-A1 | Resist polymer solution and process for producing the same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20060204888-A1 | Positive photosensitive resin, process for production thereof, and resist composition containing positive photosensitive resin | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2006-09-14 | — | — | US | disclosed |
| US-7045582-B2 | Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process | MARUZEN PETROCHEMICAL CO. LTD. (JP) | 2006-05-16 | — | — | US | disclosed |
| US-20060068324-A1 | Positive photosensitive resin and novel dithiol compound | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2006-03-30 | — | — | US | disclosed |
| US-20060058433-A1 | Method for prevention of increase in particles in copolymer for semiconductor resist | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050131184-A1 | Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| US-20050096447-A1 | Production process of copolymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2005-05-05 | — | — | US | disclosed |