⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL205358 | 0.95 | — | — | |
| SCHEMBL30578458 | 0.90 | — | — | |
| SCHEMBL476832 | 0.86 | ALDH1A1 (0.42) | — | |
| Ammonia Solution, Strong SCHEMBL5088015 | 0.76 | — | — | |
| SCHEMBL10942109 | 0.73 | TSHR (0.38) | — | |
| Ammonia Solution, Strong SCHEMBL17508556 | 0.73 | — | — | |
| 1,5-Pentanediol SCHEMBL4651355 | 0.71 | LMNA (0.45) | — | |
| Hydrochloric Acid SCHEMBL9720337 | 0.70 | — | — | |
| SCHEMBL2164167 | 0.70 | TSHR (0.41) | — | |
| SCHEMBL2886957 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6152148-A | APPLYING MECHANICAL FRICTIONAL FORCE TO THE SURFACE OF THE WAFER BEARING A POLY(ARYLENE ETHER) DIELECTRIC LAYER WHILE APPLYING TO THE SURFACE AN ALKALINE AQUEOUS SOLUTION COMPRISING A SURFACTANT AND A TETRAALKYLAMMONIUM HYDROXYDE | HONEYWELL, INC. (US) | 2000-11-28 | — | — | US | claimed |
| WO-2000014785-A1 | A METHOD FOR CLEANING ORGANIC DIELECTRIC FILM CONTAINING SEMICONDUCTOR WAFERS | ALLIEDSIGNAL INC. (US) | 2000-03-16 | — | — | WO | claimed |
| EP-2778782-B1 | Negative working radiation-sensitive elements | KODAK GRAPHIC COMM GMBH (DE) | 2015-12-30 | — | — | EP | disclosed |
| EP-2778782-A1 | Negative working radiation-sensitive elements | Kodak Graphic Communications GmbH (DE) | 2014-09-17 | — | — | EP | disclosed |
| EP-2735903-A1 | Negative working lithographic printing plate precursors comprising a hyperbranched binder material | Eastman Kodak Company (US) | 2014-05-28 | — | — | EP | disclosed |
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| EP-2293144-B1 | Method of drying lithographic printing plates after single-step-processing | EASTMAN KODAK CO (US) | 2012-11-07 | — | — | EP | disclosed |
| US-20120152139-A1 | METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES | QUALEX INC. | 2012-06-21 | — | — | US | disclosed |
| EP-2284005-B1 | Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers | EASTMAN KODAK CO (US) | 2012-05-02 | — | — | EP | disclosed |
| US-20070196776-A1 | Stable High Ph Developer | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2007-08-23 | — | — | US | disclosed |
| EP-1723471-A2 | STABLE HIGH PH DEVELOPER | Kodak Polychrome Graphics GmbH (DE) | 2006-11-22 | — | — | EP | disclosed |
| WO-2006063626-A2 | STABLE HIGH PH DEVELOPER | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-06-22 | — | — | WO | disclosed |
| EP-0804753-B1 | METHOD OF DEVELOPING POSITIVE PHOTORESIST AND DEVELOPING COMPOSITIONS THEREFOR | CLARIANT FINANCE BVI LTD (VG) | 2001-05-02 | — | — | EP | disclosed |
| US-6152148-A | APPLYING MECHANICAL FRICTIONAL FORCE TO THE SURFACE OF THE WAFER BEARING A POLY(ARYLENE ETHER) DIELECTRIC LAYER WHILE APPLYING TO THE SURFACE AN ALKALINE AQUEOUS SOLUTION COMPRISING A SURFACTANT AND A TETRAALKYLAMMONIUM HYDROXYDE | HONEYWELL, INC. (US) | 2000-11-28 | — | — | US | disclosed |
| US-5821036-A | DEVELOPER INCLUDES AN AMMONIUM HYDROXIDE AQUEOUS BASE AND A SURFACTANT OF THE FLUORINATED ALKYL ALKOXYLATE CLASS | CLARIANT FINANCE (BVI) LIMITED (VG) | 1998-10-13 | — | — | US | disclosed |
| EP-0804753-A1 | METHOD OF DEVELOPING POSITIVE PHOTORESIST AND COMPOSITIONS THEREFOR | HOECHST CELANESE CORPORATION (US) | 1997-11-05 | — | — | EP | disclosed |
| WO-1997034200-A1 | PROCESS FOR DEVELOPING A POSITIVE PHOTORESIST | HOECHST CELANESE CORPORATION (US) | 1997-09-18 | — | — | WO | disclosed |
| WO-1996022564-A1 | METHOD OF DEVELOPING POSITIVE PHOTORESIST AND COMPOSITIONS THEREFOR | HOECHST CELANESE CORPORATION (US) | 1996-07-25 | — | — | WO | disclosed |