SCHEMBL490802

SCHEMBL490802

CCOc1ccccc1C1(C2(c3ccccc3OCC)N=C(c3ccccc3)C(c3ccccc3)=N2)N=C(c2ccccc2)C(c2ccccc2)=N1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
L3MBTL1 Q9Y468 2/20 0.40
GLA P06280 1/20 0.40
ADORA1 P30542 3/20 0.40
ADORA2A P29274 2/20 0.40
ADORA3 P0DMS8 1/20 0.39
POLB P06746 1/20 0.38
PDK2 Q15119 1/20 0.38
TP53 P04637 2/20 0.37
CACNA2D1 P54289 1/20 0.37
KDM4E B2RXH2 2/20 0.37
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
HSD17B10 Q99714 1/20 0.37
MAPT P10636 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.36
HPGD P15428 1/20 0.36
GAA P10253 1/20 0.36
CYP2C19 P33261 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL490783 0.84 MCHR1 (0.43) MAPTCYP2C19
SCHEMBL152089 0.81 CA12 (0.41) ALDH1A1L3MBTL1TP53KDM4ENPC1
SCHEMBL11595679 0.76 KMT2A (0.37) ALDH1A1L3MBTL1TP53KDM4ENPC1
SCHEMBL5841127 0.75 ALDH1A1 (0.40) ALDH1A1L3MBTL1TP53KDM4ENPC1
SCHEMBL31192369 0.75 CYP2D6 (0.41) ALDH1A1PDK2TP53KDM4ENPC1
SCHEMBL149221 0.75 CYP2D6 (0.41) ALDH1A1PDK2TP53KDM4ENPC1
SCHEMBL5551938 0.74 ALDH1A1 (0.50) ALDH1A1L3MBTL1TP53CACNA2D1KDM4E
SCHEMBL81799 0.72 ALDH1A1 (0.38) ALDH1A1L3MBTL1POLBTP53KDM4E
SCHEMBL22871193 0.70 ALDH1A1 (0.47) ALDH1A1L3MBTL1GLAPDK2KDM4E
SCHEMBL8665403 0.70 MAPT (0.48) ALDH1A1PDK2KDM4ENPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9791773-B2 Photosensitive resin composition, color filter and liquid crystal display device CHI MEI CORPORATION (TW) 2017-10-17 US disclosed
US-9285681-B2 Photosensitive resin composition and uses thereof CHI MEI CORPORATION (TW) 2016-03-15 US disclosed
US-20140356786-A1 PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF CHI MEI CORPORATION (TW) 2014-12-04 US disclosed
US-20140175347-A1 Photosensitive Resin Composition, Color Filter And Liquid Crystal Display Device CHI MEI CORPORATION (TW) 2014-06-26 US disclosed
US-8652759-B2 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer EASTMAN KODAK COMPANY (US) 2014-02-18 US disclosed
US-8632937-B2 UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer EASTMAN KODAK COMPANY (US) 2014-01-21 US disclosed
EP-1849600-B1 Bakeable radiation-sensitive elements with a high resistance to chemicals EASTMAN KODAK CO (US) 2013-12-11 EP disclosed
US-8507181-B2 Method for developing and sealing of lithographic printing plates KODAK (NEAR EAST) INC. 2013-08-13 US disclosed
US-8361701-B2 Method for making lithographic plates EASTMAN KODAK COMPANY (US) 2013-01-29 US disclosed
US-20120152139-A1 METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES QUALEX INC. 2012-06-21 US disclosed
EP-1690138-A1 RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON Kodak Polychrome Graphics GmbH (DE) 2006-08-16 EP disclosed
US-20060154169-A1 Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon KODAK POLYCHROME GRAPHICS GMBH (DE) 2006-07-13 US disclosed
WO-2006053689-A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC OR POLYMERIC SENSITIZERS KODAK POLYCHROME GRAPHICS GMBH (DE) 2006-05-26 WO disclosed
US-20060063101-A1 Radiation-sensitive elements KODAK POLYCHROME GRAPHICS LLC (US) 2006-03-23 US disclosed
EP-1586006-A1 RADIATION-SENSITIVE ELEMENTS Kodak Polychrome Graphics GmbH (DE) 2005-10-19 EP disclosed
WO-2005054952-A1 RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2005-06-16 WO disclosed
WO-2004111731-A1 RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-12-23 WO disclosed
WO-2004049068-A1 RADIATION-SENSITIVE ELEMENTS KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-06-10 WO disclosed
US-4732831-A MONOMERS, TONERS, CHAIN TRANSFER AGENTS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1988-03-22 US disclosed
US-4017313-A Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-04-12 US disclosed