SCHEMBL149221

SCHEMBL149221

CCc1ccccc1C1(C2(c3ccccc3CC)N=C(c3ccccc3)C(c3ccccc3)=N2)N=C(c2ccccc2)C(c2ccccc2)=N1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.41
ALDH1A1 P00352 3/20 0.39
HDAC4 P56524 1/20 0.37
PDK2 Q15119 2/20 0.34
TSHR P16473 3/20 0.33
KDM4E B2RXH2 1/20 0.33
CYP1A2 P05177 1/20 0.33
MAPT P10636 1/20 0.33
CYP2C9 P11712 1/20 0.33
HPGD P15428 1/20 0.33
CYP2C19 P33261 1/20 0.33
HSD17B10 Q99714 1/20 0.33
HTT P42858 1/20 0.33
GABRA1 P14867 3/20 0.32
GABRB2 P47870 3/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
GABRG2 P18507 1/20 0.32
GABRB3 P28472 1/20 0.32
GABRA5 P31644 1/20 0.32
GABRA3 P34903 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31192369 1.00 CYP2D6 (0.41) CYP2D6ALDH1A1HDAC4PDK2TSHR
SCHEMBL8665435 0.84 MAPT (0.42) ALDH1A1TSHRKDM4EMAPTHPGD
SCHEMBL2497246 0.82 ALDH1A1 (0.39) ALDH1A1PDK2CYP1A2MAPTHPGD
SCHEMBL2492082 0.80 TSHR (0.42) ALDH1A1TSHRKDM4EMAPTHPGD
SCHEMBL8427318 0.79 PDK2 (0.46) ALDH1A1PDK2TSHRKDM4ECYP1A2
SCHEMBL81799 0.76 ALDH1A1 (0.38) ALDH1A1HDAC4TSHRKDM4EMAPT
SCHEMBL490802 0.75 ALDH1A1 (0.41) ALDH1A1PDK2KDM4EMAPTHPGD
SCHEMBL2499642 0.75 BCL2 (0.40) ALDH1A1GABRA1GABRB2TP53
SCHEMBL8665932 0.73 IDO1 (0.37) ALDH1A1HDAC4TSHRMAPTHPGD
SCHEMBL155813 0.72 ALDH1A1 (0.34) ALDH1A1HDAC4TSHRHPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190207113-A1 POLYTHIOPHENE DERIVATIVE, COMPOSITE AND MANUFACTURE METHOD THEREOF SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2019-07-04 US claimed
US-12607932-B2 Photosensitive composition and film prepared from the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2026-04-21 US disclosed
US-20250333579-A1 COMPOSITION AND PACKAGE STRUCTURE INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2025-10-30 US disclosed
US-12421337-B2 Resin composition and cured film ECHEM SOLUTIONS CORP. (TW) 2025-09-23 US disclosed
US-12372870-B2 Photosensitive resin composition, optical film, and method of producing the same ECHEM SOLUTIONS CORP. (TW) 2025-07-29 US disclosed
US-20250171664-A1 DOUBLE-SIDED ADHESIVE AND MULTILAYER STRUCTURE INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2025-05-29 US disclosed
US-20230378532-A1 PolyElectrolyte Composition and Methods of Preparation Thereof Kraton Corporation (US) 2023-11-23 US disclosed
EP-4280332-A1 POLYELECTROLYTE COMPOSITION AND METHODS OF PREPARATION THEREOF Kraton Polymers Nederland B.V. (NL) 2023-11-22 EP disclosed
US-20230352733-A1 ELECTROLYTE COMPOSITION, QUASI-SOLID ELECTROLYTE AND LITHIUM-ION BATTERY EMPLOYING THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2023-11-02 US disclosed
EP-4270579-A2 ELECTROLYTE COMPOSITION, QUASI-SOLID ELECTROLYTE AND LITHIUM-ION BATTERY EMPLOYING THE SAME Industrial Technology Research Institute (TW) 2023-11-01 EP disclosed
US-20130142966-A1 BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTERS AND USES THEREOF CHI MEI CORPORATION (TW) 2013-06-06 US disclosed
US-20130021543-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2013-01-24 US disclosed
US-20120057098-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2012-03-08 US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20110228201-A1 Photosensitive resin composition for color filter and color filter using same CHI-MEI CORPORATION 2011-09-22 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 US disclosed
US-20070238047-A1 Photosensitive resin composition for color filters CHI-MEI CORPORATION 2007-10-11 US disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12607932-B2 Photosensitive composition and film prepared from the same SETD2, SETD1B, DDT CYP2D6 2205/4885ALDH1A1 1387/4885HDAC4 2900/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.