SCHEMBL4909167

SCHEMBL4909167

C=CC(=O)NC(C)(CC)CC

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.44
CYP3A4 P08684 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
TSHR P16473 3/20 0.41
MAPK1 P28482 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
ZDHHC20 Q5W0Z9 1/20 0.39
ZDHHC2 Q9UIJ5 1/20 0.39
GAA P10253 1/20 0.32
THRB P10828 2/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
TGM2 P21980 1/20 0.31
THRA P10827 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphonic Acid SCHEMBL2559059 0.92 ALDH1A1 (0.40) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR
SCHEMBL8764635 0.88 ALDH1A1 (0.40) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR
SCHEMBL10798243 0.86 ALDH1A1 (0.46) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR
SCHEMBL13783655 0.86 ALDH1A1 (0.39) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR
SCHEMBL21728872 0.86 ALDH1A1 (0.39) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR
SCHEMBL8765395 0.85 TSHR (0.39) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR
SCHEMBL8764497 0.85 ZDHHC20 (0.44) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR
SCHEMBL5178205 0.85 ALDH1A1 (0.41) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR
SCHEMBL13687880 0.85 ALDH1A1 (0.38) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR
SCHEMBL363117 0.83 ALDH1A1 (0.37) ALDH1A1CYP3A4CYP2C9CYP2C19TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8188179-B2 comprising water, pigments, a water-soluble solvents and an addition-condensation copolymer as a dispersant; dispersion and storage stability, used for producing images having wear and offset resistance CANON KABUSHIKI KAISHA (JP) 2012-05-29 US claimed
CN-111826022-A UV (ultraviolet) photocuring high-corrosion-resistance and high-sensitivity liquid photosensitive ink and preparation method thereof 张家港科思创感光新材料有限公司 2020-10-27 CN disclosed
US-8188179-B2 comprising water, pigments, a water-soluble solvents and an addition-condensation copolymer as a dispersant; dispersion and storage stability, used for producing images having wear and offset resistance CANON KABUSHIKI KAISHA (JP) 2012-05-29 US disclosed
US-20080146723-A1 INK-JET RECORDING PIGMENT INK CANON KABUSHIKI KAISHA (JP) 2008-06-19 US disclosed
EP-0505972-B1 Process for producing styrenic copolymer IDEMITSU KOSAN CO (JP) 1997-06-11 EP disclosed
EP-0490269-B1 Graft copolymer and process for producing the same IDEMITSU KOSAN CO (JP) 1996-02-28 EP disclosed
US-5275811-A Terpolymer resin of vinyl ester, acrylamide and maleate ISP INVESTMENTS INC. (US) 1994-01-04 US disclosed
US-5250629-A Graft polymerization of styrene and ethylenically unsaturated monomer using transition metal catalysts, organoaluminum compounds; films, packaging, automobile parts IDEMITSU KOSAN CO., LTD. (JP) 1993-10-05 US disclosed
US-5196495-A Hair spray; terpolymer of a vinyl ester, alkyl maleate half ester and a substituted acrylamide ISP INVESTMENTS INC. (US) 1993-03-23 US disclosed
EP-0505972-A2 Process for producing styrenic copolymer IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-09-30 EP disclosed
EP-0490269-A1 Graft copolymer and process for producing the same IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-06-17 EP disclosed