SCHEMBL4911491

SCHEMBL4911491

O=C(OCC1CO1)C1CC2C=CC1C2

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.54
CYP3A4 P08684 1/20 0.54
POLB P06746 3/20 0.45
HSD17B10 Q99714 2/20 0.45
APEX1 P27695 1/20 0.45
RECQL P46063 1/20 0.45
BLM P54132 1/20 0.45
ESR2 Q92731 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
ALDH1A1 P00352 10/20 0.44
KMT2A Q03164 3/20 0.44
RAB9A P51151 1/20 0.44
KDM4E B2RXH2 2/20 0.44
LMNA P02545 2/20 0.44
HPGD P15428 1/20 0.43
MEN1 O00255 1/20 0.42
ALOX15 P16050 1/20 0.42
TSHR P16473 1/20 0.42
HTT P42858 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6830364 0.90 TP53 (0.44) TP53CYP3A4POLBHSD17B10APEX1
SCHEMBL10036678 0.88 TP53 (0.55) TP53CYP3A4POLBHSD17B10APEX1
SCHEMBL28383171 0.85 POLB (0.44) TP53CYP3A4POLBHSD17B10APEX1
SCHEMBL22654022 0.81 CA2 (0.41) TP53CYP3A4POLBHSD17B10APEX1
SCHEMBL24255312 0.81 ALDH1A1 (0.46) TP53CYP3A4POLBHSD17B10APEX1
SCHEMBL19708550 0.81 ALDH1A1 (0.46) POLBHSD17B10APEX1RECQLBLM
SCHEMBL417020 0.81 ALDH1A1 (0.46) POLBHSD17B10APEX1RECQLBLM
SCHEMBL10388301 0.80 ALDH1A1 (0.53) POLBHSD17B10APEX1RECQLBLM
SCHEMBL13897067 0.80 ALDH1A1 (0.53) POLBHSD17B10APEX1RECQLBLM
SCHEMBL14213298 0.80 ALDH1A1 (0.53) POLBHSD17B10APEX1RECQLBLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118126325-A Low-temperature-cured alkali-soluble photosensitive resin and preparation method thereof 深圳先进电子材料国际创新研究院 2024-06-04 CN claimed
US-9152041-B2 Display panel including patterned spacer LG CHEM, LTD. (KR) 2015-10-06 US claimed
US-8703901-B2 Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof LG CHEM, LTD. (KR) 2014-04-22 US claimed
EP-1779197-B1 DISPLAY PANEL INCLUDIDNG PATTERNED SPACER LG CHEMICAL LTD (KR) 2013-11-20 EP claimed
US-20120308741-A1 TRANSPARENT, HIGHLY HEAT-RESISTANT POLYIMIDE PRECURSOR AND PHOTOSENSITIVE POLYIMIDE COMPOSITION THEREOF LG CHEM, LTD. (KR) 2012-12-06 US claimed
US-8232366-B2 Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof LG CHEM, LTD. (KR) 2012-07-31 US claimed
CN-101423606-B Negative photosensitive polyimide material and preparation method thereof BYD CO LTD 2012-05-02 CN claimed
CN-101423606-A Negative photosensitive polyimide material and preparation method thereof BYD CO LTD (CN) 2009-05-06 CN claimed
US-20070093640-A1 Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof LG CHEM, LTD. (KR) 2007-04-26 US claimed
WO-2004086146-A1 TRANSPARENT, HIGHLY HEAT-RESISTANT POLYIMIDE PRECURSOR AND PHOTOSENSITIVE POLYIMIDE COMPOSITION THEREOF LG CHEM LTD (KR) 2004-10-07 WO claimed
CN-118126325-A Low-temperature-cured alkali-soluble photosensitive resin and preparation method thereof 深圳先进电子材料国际创新研究院 2024-06-04 CN disclosed
CN-117624445-A Acrylic polymer, photosensitive resin composition and application thereof 合肥鼎材科技有限公司 2024-03-01 CN disclosed
US-20240018298-A1 OLEFINIC COMPOSITIONS COMPRISING HYDROCARBON RESINS ExxonMobil Product Solutions Company 2024-01-18 US disclosed
CN-111057028-B Fluorine-containing cationic polymerization monomer and synthesis and application thereof 北京师范大学 2021-12-10 CN disclosed
CN-111057028-A Fluorine-containing cationic polymerization monomer and synthesis and application thereof 北京师范大学 2020-04-24 CN disclosed
US-20080213514-A1 Obtained from a photosensitive resin composition comprising a 2,4-bis(trichloromethyl)-6-(p-substituted alkylthiophenyl) triazine photoiniator, an alkali-soluble photocurable binder, and a monomer such as dipentaerythritol hexaacrylate; high strength, sensitivity, residue characteristics, film uniformity LG CHEM, LTD. (KR) 2008-09-04 US disclosed
EP-1779197-A1 DISPLAY PANEL INCLUDIDNG PATTERNED SPACER LG Chem, Ltd. (KR) 2007-05-02 EP disclosed
US-20070093640-A1 Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof LG CHEM, LTD. (KR) 2007-04-26 US disclosed
WO-2006004364-A1 DISPLAY PANEL INCLUDIDNG PATTERNED SPACER LG CHEM, LTD. (KR) 2006-01-12 WO disclosed
WO-2004086146-A1 TRANSPARENT, HIGHLY HEAT-RESISTANT POLYIMIDE PRECURSOR AND PHOTOSENSITIVE POLYIMIDE COMPOSITION THEREOF LG CHEM LTD (KR) 2004-10-07 WO disclosed