Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.39 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.37 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.37 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.37 |
| ▸ | RELA | Q04206 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8668248 | 0.86 | ALDH1A1 (0.46) | SLC6A3MAPTKDM4EMAPK1MEN1 | |
| SCHEMBL8663506 | 0.86 | CYP1A2 (0.46) | SLC6A3MAPTKDM4EMAPK1MEN1 | |
| SCHEMBL8668417 | 0.82 | ALDH1A1 (0.43) | MAPTKDM4EMAPK1MEN1KMT2A | |
| SCHEMBL8666981 | 0.81 | MAPT (0.39) | SLC6A3MAPTKDM4EMAPK1MEN1 | |
| SCHEMBL8667184 | 0.76 | CYP1A2 (0.38) | MAPTKDM4EMAPK1MEN1KMT2A | |
| SCHEMBL8663516 | 0.76 | MAPT (0.38) | SLC6A3MAPTKDM4EMAPK1MEN1 | |
| SCHEMBL31383390 | 0.70 | MEN1 (0.44) | SLC6A3MAPTKDM4EMAPK1MEN1 | |
| SCHEMBL9929061 | 0.70 | MEN1 (0.44) | SLC6A3MAPTKDM4EMAPK1MEN1 | |
| SCHEMBL25302086 | 0.70 | ALDH1A1 (0.59) | MAPTKDM4EMAPK1NISCHALDH1A1 | |
| SCHEMBL29350007 | 0.70 | ALDH1A1 (0.59) | MAPTKDM4EMAPK1NISCHALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8652759-B2 | Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer | EASTMAN KODAK COMPANY (US) | 2014-02-18 | — | — | US | disclosed |
| EP-1849600-B1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK CO (US) | 2013-12-11 | — | — | EP | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| US-8361701-B2 | Method for making lithographic plates | EASTMAN KODAK COMPANY (US) | 2013-01-29 | — | — | US | disclosed |
| EP-2293144-B1 | Method of drying lithographic printing plates after single-step-processing | EASTMAN KODAK CO (US) | 2012-11-07 | — | — | EP | disclosed |
| US-20120152139-A1 | METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES | QUALEX INC. | 2012-06-21 | — | — | US | disclosed |
| US-8137891-B2 | Bakeable lithographic printing plates with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2012-03-20 | — | — | US | disclosed |
| US-8119331-B2 | Photopolymer composition usable for lithographic plates | KODAK GRAPHIC COMMUNICATIONS GMBH (DE) | 2012-02-21 | — | — | US | disclosed |
| US-8105755-B2 | Method for processing of photopolymer printing plates with overcoat | EASTMAN KODAK COMPANY (US) | 2012-01-31 | — | — | US | disclosed |
| US-8034538-B2 | Negative-working imageable elements | EASTMAN KODAK COMPANY (US) | 2011-10-11 | — | — | US | disclosed |
| US-20060154169-A1 | Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-07-13 | — | — | US | disclosed |
| WO-2006053689-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC OR POLYMERIC SENSITIZERS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-05-26 | — | — | WO | disclosed |
| WO-2006044243-A2 | HOLOGRAPHIC STORAGE MEDIUM | GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) | 2006-04-27 | — | — | WO | disclosed |
| US-20060078802-A1 | Holographic storage medium | SABIC INNOVATIVE PLASTICS IP B.V. | 2006-04-13 | — | — | US | disclosed |
| US-20060063101-A1 | Radiation-sensitive elements | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-03-23 | — | — | US | disclosed |
| EP-1586006-A1 | RADIATION-SENSITIVE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2005-10-19 | — | — | EP | disclosed |
| WO-2005054952-A1 | RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2005-06-16 | — | — | WO | disclosed |
| WO-2004111731-A1 | RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-12-23 | — | — | WO | disclosed |
| WO-2004049068-A1 | RADIATION-SENSITIVE ELEMENTS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2004-06-10 | — | — | WO | disclosed |
| US-4017313-A | Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-04-12 | — | — | US | disclosed |