Methacrylic Acid

Methacrylic Acid

SCHEMBL4915338

C=C(C(=O)O)C(C)C=Cc1ccccc1.C=C(C)C(=O)O

nearest known ligand 0.46

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 4/20 0.46
GLA P06280 1/20 0.46
CYP3A4 P08684 1/20 0.45
CYP1A2 P05177 2/20 0.45
HPGD P15428 1/20 0.42
AKR1C3 P42330 1/20 0.42
MAPT P10636 3/20 0.40
RECQL P46063 2/20 0.40
LMNA P02545 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
HDAC3 O15379 2/20 0.40
HDAC4 P56524 2/20 0.40
HDAC1 Q13547 2/20 0.40
HDAC7 Q8WUI4 2/20 0.40
HDAC2 Q92769 2/20 0.40
HDAC10 Q969S8 2/20 0.40
HDAC11 Q96DB2 2/20 0.40
HDAC8 Q9BY41 2/20 0.40
HDAC6 Q9UBN7 2/20 0.40
HDAC9 Q9UKV0 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL179701 0.95 CYP1A2 (0.49) TDP1GLACYP3A4CYP1A2HPGD
Butadiene SCHEMBL14976845 0.90 CYP1A2 (0.45) TDP1GLACYP3A4CYP1A2HPGD
Acrylonitrile SCHEMBL17443016 0.84 CYP1A2 (0.41) TDP1GLACYP3A4CYP1A2HPGD
Methacrylic Acid SCHEMBL17508528 0.84 LMNA (0.46) MAPTLMNASMN1; SMN2HCAR2ALDH1A1
SCHEMBL8357680 0.83 HTT (0.40) TDP1GLACYP3A4CYP1A2MAPT
(Z)-1,2-Diphenylethene SCHEMBL3017352 0.82 GLA (0.59) TDP1GLACYP3A4CYP1A2AKR1C3
(Z)-1,2-Diphenylethene SCHEMBL9983047 0.82 GLA (0.59) TDP1GLACYP3A4CYP1A2AKR1C3
(Z)-1,2-Diphenylethene SCHEMBL3017350 0.82 GLA (0.59) TDP1GLACYP3A4CYP1A2AKR1C3
SCHEMBL28318719 0.80 TDP1 (0.53) TDP1GLACYP3A4CYP1A2AKR1C3
SCHEMBL10454933 0.80 CYP3A4 (0.49) TDP1GLACYP3A4CYP1A2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080213688-A1 Photosensitive Transfer Material, Pattern Forming Process, and Patterns FUJIFILM CORPORATION (JP) 2008-09-04 US disclosed
EP-1801648-A1 PHOTOSENSITIVE TRANSFER MATERIAL AND PATTERN FORMING METHOD AND PATTERN FUJIFILM Corporation (JP) 2007-06-27 EP disclosed
US-20050260523-A1 Photoresist composition for LCD light diffuse reflecting film EVERLIGHT USA, INC. (US) 2005-11-24 US disclosed