SCHEMBL4921734

SCHEMBL4921734

[CH2]OC(=O)C=CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4921726 1.00
SCHEMBL8000441 1.00
SCHEMBL1071659 0.75 HCAR2 (0.40)
SCHEMBL1071656 0.75 HCAR2 (0.40)
SCHEMBL16504 0.75 HCAR2 (0.40)
SCHEMBL25405174 0.75 HCAR2 (0.40)
SCHEMBL16505 0.75 HCAR2 (0.40)
SCHEMBL25405178 0.75 HCAR2 (0.40)
SCHEMBL16503 0.75 HCAR2 (0.40)
SCHEMBL37099 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230303404-A1 NANOPARTICLES, DISPERSION OF NANOPARTICLES, AND PRODUCTION METHOD OF NANOPARTICLES TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-28 US disclosed
US-20230242692-A1 COMPOSITION AND CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2023-08-03 US disclosed
CN-103257525-B Colorant, color composition for color filter, colour filter and display element JSR株式会社 2018-05-18 CN disclosed
CN-103048880-B Colouring agent, coloured composition, colour filter and display element JSR株式会社 2018-03-16 CN disclosed
CN-104769460-B Antiglare layer formation composition, antiglare film, Polarizer and display device 东友精细化工有限公司 2017-08-18 CN disclosed
CN-102408798-B Transparent coating formation coating fluid and the base material of band transparent coating GC CATALYSTS AND CHEMICALS LT (JP) 2016-12-14 CN disclosed
CN-103889916-B Sizing composition for glass fibers 3B FIBREGLASS SPRL (BE) 2016-11-30 CN disclosed
CN-106104322-A Functional membrane, polaroid and display device 柯尼卡美能达株式会社 2016-11-09 CN disclosed
CN-104892944-A Preparation method of (methyl)acryloyloxy methyl-terminiated polysiloxanes UNIV SHANDONG 2015-09-09 CN disclosed
CN-101646718-B Curable resin composition, protective film, and method for forming protective film JSR CORP JP 2013-04-03 CN disclosed
CN-1975574-B Radiation sensitive resin composition SUMITOMO CHEMICAL CO 2011-06-15 CN disclosed
CN-1716094-B Radiation sensitive resin composition SUMITOMO CHEMICAL CO 2010-12-15 CN disclosed
CN-101646718-A The formation method of curable resin composition, protective membrane and protective membrane JSR CORP JP 2010-02-10 CN disclosed
US-20080200475-A1 4-Piperazinothieno[2,3-D] Pyrimidine Compounds As Platelet Aggregation Inhibitors PFIZER INC. 2008-08-21 US disclosed
CN-101226329-A Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof JSR CORP (JP) 2008-07-23 CN disclosed
EP-1866317-A1 4-PIPERAZINOTHIENO [2, 3-D] PYRIMIDINE COMPOUNDS AS PLATELET AGGREGATION INHIBITORS Pharmacia & Upjohn Company LLC (US) 2007-12-19 EP disclosed
CN-1975574-A Radiation sensitive resin composition SUMITOMO CHEMICAL CO (JP) 2007-06-06 CN disclosed
WO-2006103555-A1 4-PIPERAZINOTHIENO [2, 3-D] PYRIMIDINE COMPOUNDS AS PLATELET AGGREGATION INHIBITORS PHARMACIA & UPJOHN COMPANY LLC (US) 2006-10-05 WO disclosed
CN-1716094-A Radiation sensitive resin composition SUMITOMO CHEM ENG (JP) 2006-01-04 CN disclosed
EP-1329160-A2 4-ACYLAMINOPYRAZOLE DERIVATIVES Sankyo Company, Limited (JP) 2003-07-23 EP disclosed