SCHEMBL4923748

SCHEMBL4923748

COCCN1C(=O)CC(=O)N(CCOC)C1=O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.44
KMT2A Q03164 4/20 0.44
MEN1 O00255 3/20 0.44
USP2 O75604 2/20 0.44
HTT P42858 2/20 0.44
HSD17B10 Q99714 2/20 0.44
GAA P10253 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
ALDH1A1 P00352 5/20 0.42
POLB P06746 2/20 0.40
KDM4E B2RXH2 1/20 0.40
RECQL P46063 1/20 0.40
BLM P54132 1/20 0.40
PLA2G7 Q13093 1/20 0.38
SMN1; SMN2 Q16637 5/20 0.37
HPGD P15428 1/20 0.37
BMPR1B O00238 1/20 0.34
BMPR1A P36894 1/20 0.34
TGFBR1 P36897 1/20 0.34
ACVRL1 P37023 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11803961 0.92 F2 (0.43) MAPTKMT2AMEN1USP2HTT
SCHEMBL11807557 0.90 ALDH1A1 (0.40) MAPTKMT2AMEN1USP2HTT
SCHEMBL6180533 0.88 MAPT (0.42) MAPTKMT2AMEN1USP2HTT
SCHEMBL11806010 0.88 ALDH1A1 (0.55) MAPTKMT2AMEN1USP2HTT
SCHEMBL32675956 0.84 MAPT (0.53) MAPTKMT2AMEN1USP2HTT
SCHEMBL8976843 0.83 ALDH1A1 (0.41) MAPTKMT2AMEN1USP2HTT
SCHEMBL17717950 0.81 KMT2A (0.55) MAPTKMT2AMEN1USP2HTT
SCHEMBL11803743 0.80 ALDH1A1 (0.49) MAPTKMT2AMEN1USP2HTT
SCHEMBL9132703 0.79 MEN1 (0.42) MAPTKMT2AMEN1USP2HTT
SCHEMBL11694282 0.79 ALDH1A1 (0.51) MAPTKMT2AMEN1USP2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080241762-A1 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
EP-1168066-B1 Silver salt photothermographic dry imaging material KONICA CORP (JP) 2007-12-05 EP disclosed
US-7267933-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-09-11 US disclosed
US-20070122755-A1 Heat developable photosensitive material including a combination of specified reducing agents FUJIFILM CORPORATION (JP) 2007-05-31 US disclosed
EP-1199596-B1 Silver salt photothermographic material KONICA CORP (JP) 2006-09-20 EP disclosed
US-7083908-B2 Photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 2006-08-01 US disclosed
US-20060147852-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2006-07-06 US disclosed
US-7022470-B2 Photothermographic imaging material KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2006-04-04 US disclosed
US-20050147931-A1 Process for manufacturing a photothermographic material FUJI PHOTO FILM CO., LTD. 2005-07-07 US disclosed
EP-1035430-B1 Silver halide photographic material KONISHIROKU PHOTO IND (JP) 2005-01-05 EP disclosed
US-6297001-B1 NONPHOTOSENSITIVE ORGANIC SILVER SALT, A PHOTOSENSITIVE SILVER HALIDE, A REDUCING AGENT, A BINDER AND A CROSS-LINKING AGENT; THE PHOTOTHERMOGRAPHIC MATERIAL FURTHER COMPRISING A COMPOUND CAPABLE OF GENERATING A LABILE SPECIES OTHER THAN A HALOGEN KONICA CORPORATION (JP) 2001-10-02 US disclosed
EP-1132767-A2 Photothermographic material KONICA CORPORATION (JP) 2001-09-12 EP disclosed
US-6265146-B1 SUPPORT HAVING THEREON AN ORGANIC SILVER SALT, A BINDER, A PHOTOSENSITIVE SILVER HALIDE, AN INFRARED-SENSITIZING DYE AND A HETEROATOM CONTAINING MACROCYCLIC COMPOUND. KONICA CORPORATION (JP) 2001-07-24 US disclosed
EP-1083459-A1 Photothermographic material KONICA CORPORATION (JP) 2001-03-14 EP disclosed
EP-1079269-A1 Silver halide emulsion and silver halide light sensitive photographic material KONICA CORPORATION (JP) 2001-02-28 EP disclosed
EP-1035430-A2 Sensitizing dye and silver halide photographic material KONICA CORPORATION (JP) 2000-09-13 EP disclosed
EP-1033618-A1 Thermally developable photosensitive material KONICA CORPORATION (JP) 2000-09-06 EP disclosed
US-4326023-A Spectral sensitization of photographic emulsions EASTMAN KODAK COMPANY (US) 1982-04-20 US disclosed
US-3991054-A FOR POLYESTERS BASF AKTIENGESELLSCHAFT (DT) 1976-11-09 US disclosed
US-3987045-A POLYESTERS BASF AKTIENGESELLSCHAFT (DT) 1976-10-19 US disclosed