SCHEMBL492407

SCHEMBL492407

CC(OC(=O)C=Cc1ccccc1)(OC1=CCCC1)OC1=CCCC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 1/20 0.40
KMT2A Q03164 4/20 0.39
LMNA P02545 4/20 0.39
NPC1 O15118 4/20 0.39
RAB9A P51151 3/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
GLA P06280 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
HPGD P15428 1/20 0.39
ALDH1A1 P00352 3/20 0.38
AKR1B10 O60218 1/20 0.37
AKR1B1 P15121 1/20 0.37
TSHR P16473 1/20 0.37
MAPT P10636 3/20 0.37
HDAC3 O15379 1/20 0.37
TNKS O95271 1/20 0.37
HDAC4 P56524 1/20 0.37
HDAC1 Q13547 1/20 0.37
HCAR2 Q8TDS4 1/20 0.37
HDAC7 Q8WUI4 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5072057 0.83 HCAR2 (0.33) HCAR2
SCHEMBL5070953 0.83 HCAR2 (0.33) HCAR2
SCHEMBL6826957 0.75 HDAC3 (0.32) LMNAHDAC3HDAC4HDAC1HDAC7
Methacrylic Acid SCHEMBL1454554 0.73
SCHEMBL1006098 0.73 GLA (0.55) EGFRKMT2ALMNANPC1RAB9A
SCHEMBL126771 0.73 GLA (0.55) EGFRKMT2ALMNANPC1RAB9A
SCHEMBL832536 0.72 LMNA (0.47) KMT2ALMNANPC1RAB9ASMN1; SMN2
SCHEMBL832537 0.72 LMNA (0.47) KMT2ALMNANPC1RAB9ASMN1; SMN2
SCHEMBL27286623 0.70 CYP2C19 (0.53) EGFRKMT2ALMNANPC1RAB9A
SCHEMBL25298657 0.69 TDP1 (0.50) EGFRKMT2ALMNANPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160333131-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION FOR FLOORING MATERIALS AND INSTALLATION METHOD THEREFOR DIC CORPORATION (JP) 2016-11-17 US disclosed
US-20160333215-A1 ACTIVATING ENERGY BEAM-CURABLE COMPOSITION FOR FLOORING MATERIAL DIC CORPORATION (JP) 2016-11-17 US disclosed
EP-2007587-B1 INKJET RECORDING METHOD RICOH CO LTD (JP) 2013-07-24 EP disclosed
US-8399541-B2 Active energy ray-curable ink composition and printed matter DIC CORPORATION (JP) 2013-03-19 US disclosed
US-8142849-B2 Recording media, recording media-ink set, inkjet recording method and inkjet recording apparatus RICOH COMPANY, LTD. (JP) 2012-03-27 US disclosed
US-8104884-B2 Coating agent for UV curable inkjet printing MIMAKI ENGINEERING CO., LTD. (JP) 2012-01-31 US disclosed
US-20110221839-A1 COATING AGENT FOR UV CURABLE INKJET PRINTING MIMAKI ENGINEERING CO., LTD. (JP) 2011-09-15 US disclosed
EP-2064067-B1 INK JET RECORDING METHOD RICOH CO LTD (JP) 2011-06-08 EP disclosed
US-7938527-B2 Ink, ink cartridge, ink jet recording apparatus, and ink jet recording method RICOH COMPANY, LTD. (JP) 2011-05-10 US disclosed
US-20110014438-A1 ACTIVE ENERGY RAY-CURABLE INK COMPOSITION AND PRINTED MATTER DIC CORPORATION (JP) 2011-01-20 US disclosed
WO-2007049806-A1 RECORDING MEDIA, RECORDING MEDIA-INK SET, INKJET RECORDING METHOD AND INKJET RECORDING APPARATUS RICOH COMPANY, LTD. (JP) 2007-05-03 WO disclosed
EP-1698647-A1 POLYMER AND PROCESS FOR PRODUCING POLYMER KANSAI PAINT CO., LTD. (JP) 2006-09-06 EP disclosed
EP-1398360-B1 RADIATION HARDENABLE ADHESIVE COMPOSITION CONTAINING DISPERSED NATURAL RUBBER FINE PARTICLES TOPPAN FORMS CO LTD (JP) 2006-08-16 EP disclosed
US-7081486-B2 Method of producing polymer SHIZUOKA UNIVERSITY (JP) 2006-07-25 US disclosed
EP-1598374-A1 METHOD OF PRODUCING POLYMER Japan as represented by President of Shizuoka University (JP) 2005-11-23 EP disclosed
US-20050143481-A1 Method of producing polymer KANSAI PAINT CO., LTD. (JP) 2005-06-30 US disclosed
US-20050080181-A1 Radiation hardenable adhesive composition containing dispersed natural rubber fine particles TOPPAN FORMS CO., LTD. (JP) 2005-04-14 US disclosed
EP-1398360-A1 RADIATION HARDENABLE ADHESIVE COMPOSITION CONTAINING DISPERSED NATURAL RUBBER FINE PARTICLES Toppan Forms Co., Ltd (JP) 2004-03-17 EP disclosed
EP-0427950-B1 A photosensitive resin composition for use in forming a relief structure ASAHI CHEMICAL IND (JP) 1996-07-17 EP disclosed
US-5336585-A Free of tunnel voids ASAHI KASEI KOGYO KABUSHIKI (JP) 1994-08-09 US disclosed