⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18258579 | 0.78 | — | — | |
| Alcohol SCHEMBL9393435 | 0.75 | — | — | |
| SCHEMBL6422980 | 0.74 | — | — | |
| SCHEMBL5491329 | 0.73 | — | — | |
| Butanone SCHEMBL8663620 | 0.73 | ALDH1A1 (0.69) | — | |
| SCHEMBL27603106 | 0.73 | — | — | |
| SCHEMBL27825567 | 0.72 | TSHR (0.46) | — | |
| SCHEMBL19715972 | 0.72 | — | — | |
| SCHEMBL19715971 | 0.72 | — | — | |
| SCHEMBL19921866 | 0.71 | TSHR (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 455 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11022884-B2 | Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-06-01 | — | — | US | claimed |
| CN-106317894-B | Silicon composition, reflecting coating and preparation method thereof and the photovoltaic module including it | 比亚迪股份有限公司 | 2019-03-29 | — | — | CN | claimed |
| CN-105457556-B | A kind of dispersant, its preparation method and its application in nano aluminium oxide is scattered | 江苏苏博特新材料股份有限公司 | 2017-11-24 | — | — | CN | claimed |
| CN-106317894-A | Organosilicone composition, reflecting coating, preparation method therefor and photovoltaic module comprising reflecting coating | 比亚迪股份有限公司 | 2017-01-11 | — | — | CN | claimed |
| CN-101910256-B | Double layered polymer capsules for the stabilization of carotenoids, the process for preparing the same, and the cosmetic composition containing the same | AMOREPACIFIC CORP | 2012-09-05 | — | — | CN | claimed |
| US-8182913-B2 | Bi-layer structured sheet having excellent printability when printed by hard roll and method for producing the same | LG CHEM, LTD. (KR) | 2012-05-22 | — | — | US | claimed |
| WO-2007083906-A9 | PRESSURE SENSITIVE ADHESIVE FOR TRANSPORTING FLEXIBLE SUBSTRATE | LG CHEM, LTD. (KR) | 2012-04-19 | — | — | WO | claimed |
| CN-101910256-A | Double layered polymer capsules for the stabilization of carotenoids, the process for preparing the same, and the cosmetic composition containing the same | AMOREPACIFIC CORP | 2010-12-08 | — | — | CN | claimed |
| US-20090176109-A1 | Bi-Layer Structured Sheet Having Excellent Printability When Printed by Hard Roll and Method for Producing the Same | LG CHEM, LTD. (KR) | 2009-07-09 | — | — | US | claimed |
| WO-2008048058-A9 | BI-LAYER STRUCTURED SHEET HAVING EXCELLENT PRINTABILITY WHEN PRINTED BY HARD ROLL AND METHOD FOR PRODUCING THE SAME | LG CHEMICAL LTD (KR) | 2008-10-23 | — | — | WO | claimed |
| WO-2008048058-A1 | BI-LAYER STRUCTURED SHEET HAVING EXCELLENT PRINTABILITY WHEN PRINTED BY HARD ROLL AND METHOD FOR PRODUCING THE SAME | LG CHEM, LTD. (KR) | 2008-04-24 | — | — | WO | claimed |
| WO-2007083906-A1 | PRESSURE SENSITIVE ADHESIVE FOR TRANSPORTING FLEXIBLE SUBSTRATE | LG CHEM, LTD. (KR) | 2007-07-26 | — | — | WO | claimed |
| US-4676913-A | Coal liquor clarification with water-soluble, high molecular weight polymers having low concentration of cationic moieties | THE DOW CHEMICAL COMPANY (US) | 1987-06-30 | — | — | US | claimed |
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| CN-114466911-B | Primer composition for silicone adhesive | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| EP-1295927-A1 | Silicone pressure-sensitive adhesive composition and pressure-sensitive adhesive tape | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-03-26 | — | — | EP | disclosed |
| CN-1306550-A | Coating contg. hydroxy acrylosilane polymer to improve mar and acid etch resistance | E I DU PONT DE NEOURS AND CO (US) | 2001-08-01 | — | — | CN | disclosed |
| US-6159654-A | Negative photosensitive polymer composition of a thermosetting polymer precursor curable by cyclodehydration upon heating | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-12-12 | — | — | US | disclosed |
| US-4676913-A | Coal liquor clarification with water-soluble, high molecular weight polymers having low concentration of cationic moieties | THE DOW CHEMICAL COMPANY (US) | 1987-06-30 | — | — | US | disclosed |