SCHEMBL4932875

SCHEMBL4932875

O=S(=O)(Cc1ccccc1)OC1CCCCC1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.50
USP2 O75604 1/20 0.50
HSD17B10 Q99714 1/20 0.50
KMT2A Q03164 1/20 0.49
TSHR P16473 1/20 0.45
CA2 P00918 4/20 0.41
CA1 P00915 3/20 0.41
FAAH O00519 1/20 0.41
PRSS1 P07477 1/20 0.41
PRSS2 P07478 1/20 0.41
ELANE P08246 1/20 0.41
PRTN3 P24158 1/20 0.41
PRSS3 P35030 1/20 0.41
CA5A P35218 1/20 0.41
CA9 Q16790 1/20 0.41
ALDH1A1 P00352 1/20 0.40
TAAR1 Q96RJ0 1/20 0.40
HTT P42858 1/20 0.40
EPHX2 P34913 1/20 0.39
MAPK1 P28482 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8338883 0.98 KMT2A (0.50) HPGDUSP2HSD17B10KMT2ATSHR
SCHEMBL30392935 0.83 HRH1 (0.49) KMT2ACA2CA1FAAHPRSS1
SCHEMBL16598014 0.83 KMT2A (0.46) HPGDUSP2HSD17B10KMT2ACA2
SCHEMBL28423557 0.83 ALDH1A1 (0.41) HPGDUSP2HSD17B10KMT2ACA2
SCHEMBL20335469 0.79 KMT2A (0.49) HPGDUSP2HSD17B10KMT2ATSHR
SCHEMBL9067290 0.78 HPGD (0.46) HPGDUSP2HSD17B10KMT2ATSHR
SCHEMBL3084455 0.77 HPGD (0.43) HPGDUSP2HSD17B10KMT2ATSHR
SCHEMBL8189491 0.76 KMT2A (0.42) HPGDUSP2HSD17B10KMT2ATSHR
SCHEMBL28445410 0.75 ALDH1A1 (0.53) HPGDUSP2HSD17B10ALDH1A1
SCHEMBL29384157 0.75 NPSR1 (0.64) HPGDHSD17B10KMT2ATSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12159967-B2 Nonaqueous electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2024-12-03 US disclosed
CN-118642328-A Composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2024-09-13 CN disclosed
EP-4030524-B1 NONAQUEOUS ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEM CORP (JP) 2024-02-07 EP disclosed
EP-4318719-A2 NONAQUEOUS ELECTROLYTE SECONDARY BATTERY Mitsubishi Chemical Corporation (JP) 2024-02-07 EP disclosed
US-20230343990-A1 NONAQUEOUS ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2023-10-26 US disclosed
US-11784342-B2 Nonaqueous electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2023-10-10 US disclosed
US-20220384840-A1 NONAQUEOUS ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2022-12-01 US disclosed
US-11450880-B2 Nonaqueous electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2022-09-20 US disclosed
EP-4030524-A1 NONAQUEOUS ELECTROLYTE SECONDARY BATTERY Mitsubishi Chemical Corporation (JP) 2022-07-20 EP disclosed
EP-3667803-B1 NONAQUEOUS ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEM CORP (JP) 2022-03-16 EP disclosed
US-20070243370-A1 Optical film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2007-10-18 US disclosed
US-20070190314-A1 Transparent article and method for producing it, and lens substrate FUJIFILM CORPORATION (JP) 2007-08-16 US disclosed
WO-2006098424-A1 ANTIREFLECTION FILM, PRODUCTION METHOD THEREOF, POLARIZING PLATE USING THE ANTIREFLECTION FILM AND IMAGE DISPLAY DEVICE USING THE ANTIREFLECTION FILM OR POLARIZING PLATE FUJIFILM CORPORATION (JP) 2006-09-21 WO disclosed
EP-0909656-B1 Image recording medium containing an acid-generating agent, image recording method and thermosensitive polymer FUJI PHOTO FILM CO LTD (JP) 2004-09-29 EP disclosed
US-6329120-B1 HIGH PHOTOSENSITIVITY AND GOOD STORAGE STABILITY, SELF-BREEDING ACID CATALYST WHICH GENERATES AN ACID AND A SUBSTITUTED AMINO COMPOUND WHICH CAUSES VARIATION IN THE ABSORPTION REGION OF FROM 360 TO 900 NM WHEN SPLIT OFF BY THE FUJI PHOTO FILM CO., LTD. (JP) 2001-12-11 US disclosed
US-6329121-B2 ACID GENERATING AGENT CAPABLE OF GENERATING ACID BY ACTION OF HEAT OR AN ACID, AND A COMPOUND CAPABLE OF CAUSING VARIATION IN THE ABSORPTION REGION OF FROM 360 TO 900 NM BY INTRAMOLECULAR REACTION TRIGGERED BY ACID FUJI PHOTO FILM CO., LTD. (JP) 2001-12-11 US disclosed
US-20010016297-A1 Image recording medium, image recording method and heat coloring polymer compound FUJIFILM CORPORATION (JP) 2001-08-23 US disclosed
EP-1038887-A1 Thermosensitive colour-forming polymer FUJI PHOTO FILM CO., LTD. (JP) 2000-09-27 EP disclosed
US-6100009-A A VINYL POLYMER HAVING BOTH (A) A PARTIAL STRUCTURE GENERATING AN ACID BY THE ACTION OF HEAT OR AN ACID AND FURTHER BREADING AN ACID BY THE ACTION OF ACID GENERATED FROM THE PARTIAL STRUCTURE, (B) CAUSING VARIATION IN ABSORPTION FUJI PHOTO FILM CO., LTD. (JP) 2000-08-08 US disclosed
EP-0909656-A2 Image recording medium containing an acid-generating agent, image recording method and thermosensitive polymer Fuji Photo Film Co., Ltd. (JP) 1999-04-21 EP disclosed