Chloroform

Chloroform

SCHEMBL4937516

ClC(Cl)Cl.ClCC(Cl)Cl

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Chloroform SCHEMBL10786102 0.95 ALDH1A1 (0.40)
SCHEMBL16435 0.94
SCHEMBL11822312 0.89
Hydrochloric Acid SCHEMBL11437100 0.89
Water SCHEMBL5134411 0.89 TSHR (0.38)
Hydrochloric Acid SCHEMBL4605099 0.89
Ammonia Solution, Strong SCHEMBL6917054 0.89
Water SCHEMBL6706113 0.89
Methylene Chloride SCHEMBL5785447 0.89
1,1,2,2-Tetrachloroethane SCHEMBL11701489 0.84 TDP1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2182788-A None JP disclosed
CN-103827976-A Deposition processes for photovoltaics PRECURSOR ENERGETICS INC 2014-05-28 CN disclosed
CN-103210505-A Deposition processes and devices for photovoltaics PRECURSOR ENERGETICS INC 2013-07-17 CN disclosed
US-7339009-B2 Cross-linked polyimide and method of making them GENERAL ELECTRIC COMPANY (US) 2008-03-04 US disclosed
US-20060135732-A1 Cross-linked polyimide and method of making them GENERAL ELECTRIC COMPANY 2006-06-22 US disclosed
JP-H02182788-A COMPLEX EMULSION LUBRICANT FOR METAL PROCESSING KYODO YUSHI KK 1990-07-17 JP disclosed