Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 7/20 | 0.38 |
| ▸ | CA1 | P00915 | 4/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | SMPD1 | P17405 | 3/20 | 0.37 |
| ▸ | CTSK | P43235 | 5/20 | 0.34 |
| ▸ | CTSS | P25774 | 1/20 | 0.33 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.33 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.33 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8416793 | 0.93 | SMPD1 (0.46) | CA2SMPD1 | |
| SCHEMBL22444285 | 0.93 | SMPD1 (0.46) | CA2SMPD1 | |
| SCHEMBL4938749 | 0.88 | CA2 (0.40) | CA2CA1MAPK1SMPD1CTSK | |
| SCHEMBL28506896 | 0.83 | SMPD1 (0.42) | CA2MAPK1SMPD1SLC1A2SLC1A1 | |
| SCHEMBL9842737 | 0.81 | SMPD1 (0.45) | CA2SMPD1 | |
| SCHEMBL8460650 | 0.81 | SMPD1 (0.45) | CA2SMPD1 | |
| SCHEMBL2119038 | 0.81 | — | — | |
| SCHEMBL22574602 | 0.80 | LMNA (0.49) | MAPK1SMPD1 | |
| SCHEMBL21956069 | 0.78 | LMNA (0.42) | MAPK1SMPD1 | |
| SCHEMBL16448310 | 0.77 | SMPD1 (0.43) | CA2CA1SMPD1SLC1A2SLC1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115700271-A | Semiconductor nanoparticle-ligand complex, method for producing same, photosensitive resin composition, and optical film | 德山新勒克斯有限公司 | 2023-02-07 | — | — | CN | disclosed |
| CN-114380945-A | Resin, resin composition and display device using the same | 德山新勒克斯有限公司 | 2022-04-22 | — | — | CN | disclosed |
| US-8216770-B2 | aromatic polyester copolymer is alkali-developable photosensitive or thermal curable; used to form pattern on filter which exhibit physical properties resist to heat and chemicals, improve developability, and adhesiveness, high resolution; use for Liquid crystal display devices | CHEIL INDUSTRIES INC. (KR) | 2012-07-10 | — | — | US | disclosed |
| CN-101479312-B | Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method | CHEIL IND INC | 2011-07-20 | — | — | CN | disclosed |
| CN-101479312-A | Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method | CHEIL IND INC (KR) | 2009-07-08 | — | — | CN | disclosed |
| US-20080090177-A1 | Resin Composition Comprising Cardo Resin, Method for Forming Pattern Using the Resin Composition and Color Filter Using Pattern Formed by the Method | CHEIL INDUSTRIES INC. (KR) | 2008-04-17 | — | — | US | disclosed |