SCHEMBL4941497

SCHEMBL4941497

CC1(C)C[Si](C)(C)[Si](C)(C)[Si](C)(CCCCl)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6658152 0.82
SCHEMBL2522524 0.81
SCHEMBL431545 0.79
SCHEMBL3965447 0.74
SCHEMBL5611264 0.73
SCHEMBL16100946 0.71 SMN1; SMN2 (0.47)
SCHEMBL1696074 0.70
SCHEMBL4940551 0.70 HRH3 (0.31)
SCHEMBL1655464 0.63
SCHEMBL10336982 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110818890-A Super-spreading wetting agent and preparation method thereof 福建华夏蓝新材料科技有限公司 2020-02-21 CN claimed
CN-110818890-A Super-spreading wetting agent and preparation method thereof 福建华夏蓝新材料科技有限公司 2020-02-21 CN disclosed
US-20080075981-A1 Magnetic recording medium HITACHI MAXELL, LTD. (JP) 2008-03-27 US disclosed
US-5576247-A ATTACHING HYDROPHOBIC ORGANIC GROUPS TO BORON-PHOSPHOROUS-SILICA LAYER TO PROVIDE MOISTURE BARRIER, REACTION WITH HEXAMETHYDISILAZANE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1996-11-19 US disclosed
EP-0350314-B1 Silicone type cinnamic acid derivative, preparation method thereof, uv-ray absorber, and external skin treatment agent. SHISEIDO CO LTD (JP) 1995-12-13 EP disclosed
US-5315022-A Sunscreen SHISEIDO COMPANY LTD. (JP) 1994-05-24 US disclosed
US-5093511-A SILICONE TYPE CINNAMIC ACID DERIVATIVE, PREPARATION METHOD THEREOF, UV-RAY ABSORBER, AND EXTERNAL SKIN TREATMENT AGENT SHISEIDO COMPANY, LTD. (JP) 1992-03-03 US disclosed
EP-0350314-A2 Silicone type cinnamic acid derivative, preparation method thereof, uv-ray absorber, and external skin treatment agent. SHISEIDO COMPANY LIMITED (JP) 1990-01-10 EP disclosed