SCHEMBL4941702

SCHEMBL4941702

CC1CCCN(C[Si](C)(C)O[Si](C)(C)C)C1

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.41
LMNA P02545 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
CYP3A4 P08684 1/20 0.37
CYP2C19 P33261 1/20 0.37
HRH3 Q9Y5N1 6/20 0.36
ALDH1A1 P00352 1/20 0.35
KMT2A Q03164 1/20 0.35
MAPK1 P28482 1/20 0.35
HRH2 P25021 1/20 0.34
HRH1 P35367 1/20 0.34
HSD17B10 Q99714 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8096778 0.78 ACHE (0.38) L3MBTL1CYP2C19HRH3ALDH1A1KMT2A
SCHEMBL4942828 0.75 HRH3 (0.32) HRH3KMT2A
SCHEMBL29967916 0.74 HRH3 (0.44) KDM4EHRH3ALDH1A1HRH2HRH1
SCHEMBL772391 0.73
SCHEMBL14086792 0.73
SCHEMBL12717639 0.73
SCHEMBL1640075 0.71 KDM4E (0.53) KDM4ELMNAL3MBTL1CYP3A4CYP2C19
SCHEMBL4633471 0.71 KDM4E (0.53) KDM4ELMNAL3MBTL1CYP3A4CYP2C19
SCHEMBL13017 0.69 KDM4E (0.45) KDM4ELMNACYP3A4CYP2C19HRH3
SCHEMBL12449639 0.69 KDM4E (0.45) KDM4ELMNACYP3A4CYP2C19HRH3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080075981-A1 Magnetic recording medium HITACHI MAXELL, LTD. (JP) 2008-03-27 US disclosed
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed