SCHEMBL494492

SCHEMBL494492

CCOC(=O)C(C)O.COCC(C)OC(C)=O

nearest known ligand 0.39

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.39
CHRM2 P08172 1/20 0.39
CHRM4 P08173 1/20 0.39
CHRM1 P11229 1/20 0.39
TBXA2R P21731 1/20 0.39
ALDH1A1 P00352 5/20 0.39
LMNA P02545 1/20 0.39
HSD17B10 Q99714 1/20 0.39
GALR3 O60755 1/20 0.38
MAPT P10636 1/20 0.38
BLM P54132 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TDP1 Q9NUW8 1/20 0.33
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethyl Acetate SCHEMBL3635964 0.97 ALDH1A1 (0.45) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL4583707 0.90 TSHR (0.33) TSHRCHRM2CHRM4CHRM1TBXA2R
Ethyl Acetate SCHEMBL5905815 0.87 ALDH1A1 (0.54) TSHRCHRM2CHRM4CHRM1TBXA2R
Propylene Glycol Diacetate SCHEMBL4196506 0.87 ALDH1A1 (0.35) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL15207313 0.86 TSHR (0.41) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL28255060 0.85 TSHR (0.47) TSHRCHRM2CHRM4CHRM1TBXA2R
Isopropyl Alcohol SCHEMBL15345279 0.83 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
Propane SCHEMBL9161382 0.83 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL23294918 0.83 TSHR (0.52) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL3249555 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 139 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1088848-B1 Porous materials SHIPLEY CO LLC (US) 2005-12-28 EP claimed
US-6602804-B2 Dielectric, polymer blend SHIPLEY COMPANY, L.L.C. 2003-08-05 US claimed
US-20030004218-A1 Porous materials SHIPLEY COMPANY, L.L.C. 2003-01-02 US claimed
US-6420441-B1 DISPERSING REMOVABLE CROSSLINKED POLYMER POROGENS IN A POLYSILOXANE, CURING, AND HEATING TO REMOVE POROGEN; LOW DIELECTRIC CONSTANT; HIGH POROSITY; INSULATION MATERIALS SHIPLEY COMPANY, L.L.C. 2002-07-16 US claimed
EP-1088848-A1 Porous materials Shipley Company LLC (US) 2001-04-04 EP claimed
US-20220259741-A1 COMPOSITION, METHOD OF PRODUCING SUBSTRATE, AND POLYMER JSR CORPORATION (JP) 2022-08-18 US disclosed
US-20220089809-A1 COMPOSITION, METHOD OF PRODUCING SUBSTRATE, AND POLYMER JSR CORPORATION (JP) 2022-03-24 US disclosed
CN-110325501-A Compound, resin, composition, pattern forming method and purification process 三菱瓦斯化学株式会社 2019-10-11 CN disclosed
CN-110198924-A Compound, resin, composition and pattern forming method 三菱瓦斯化学株式会社 2019-09-03 CN disclosed
CN-110023277-A Compound, resin, composition and corrosion-resisting pattern forming method and circuit pattern forming method 三菱瓦斯化学株式会社 2019-07-16 CN disclosed
CN-110023276-A Compound, resin, composition and corrosion-resisting pattern forming method and circuit pattern forming method 三菱瓦斯化学株式会社 2019-07-16 CN disclosed
CN-108431133-B Resin combination, prepreg, clad with metal foil plywood, resin sheet and printed circuit board 三菱瓦斯化学株式会社 2019-06-14 CN disclosed
US-20020065331-A1 Antireflective porogens SHIPLEY COMPANY, L.L.C. 2002-05-30 US disclosed
US-6391932-B1 DIELECTRIC POLYIMIDE SHIPLEY COMPANY, L.L.C. 2002-05-21 US disclosed
EP-1197998-A2 Antireflective porogens Shipley Company LLC (US) 2002-04-17 EP disclosed
WO-2002023629-A2 ELECTRONIC DEVICE MANUFACTURE SHIPLEY COMPANY, L.L.C. (US) 2002-03-21 WO disclosed
US-20020030297-A1 Electronic device manufacture SHIPLEY COMPANY, L.L.C. 2002-03-14 US disclosed
EP-1172823-A1 Porous materials Shipley Company LLC (US) 2002-01-16 EP disclosed
US-6271273-B1 Porous materials SHIPLEY COMPANY, L.L.C. 2001-08-07 US disclosed
EP-1088848-A1 Porous materials Shipley Company LLC (US) 2001-04-04 EP disclosed