Propylene Glycol Diacetate

Propylene Glycol Diacetate

SCHEMBL4196506

CC(=O)OCC(C)OC(C)=O.CCOC(=O)C(C)O.COCCO

nearest known ligand 0.35

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.35
LMNA P02545 1/20 0.35
HSD17B10 Q99714 1/20 0.35
TDP1 Q9NUW8 1/20 0.34
TSHR P16473 2/20 0.33
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
CHRM1 P11229 1/20 0.33
TBXA2R P21731 1/20 0.33
GALR3 O60755 1/20 0.32
MAPT P10636 1/20 0.32
BLM P54132 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propylene Glycol Diacetate SCHEMBL107109 0.88 TDP1 (0.40) ALDH1A1LMNAHSD17B10TDP1TSHR
Propylene Glycol Diacetate SCHEMBL106743 0.88 TDP1 (0.40) TDP1TSHRCHRM2CHRM4CHRM1
Propylene Glycol Diacetate SCHEMBL2466143 0.88 TDP1 (0.42) ALDH1A1LMNAHSD17B10TDP1TSHR
Propylene Glycol Diacetate SCHEMBL107287 0.88 TDP1 (0.42) ALDH1A1LMNAHSD17B10TDP1TSHR
Ethyl Acetate SCHEMBL3635964 0.87 ALDH1A1 (0.45) ALDH1A1LMNAHSD17B10TDP1TSHR
Propylene Glycol Diacetate SCHEMBL106590 0.87 TDP1 (0.39) ALDH1A1LMNAHSD17B10TDP1TSHR
Propylene Glycol Diacetate SCHEMBL107443 0.87 TDP1 (0.41) ALDH1A1LMNAHSD17B10TDP1TSHR
SCHEMBL494492 0.87 TSHR (0.39) ALDH1A1LMNAHSD17B10TDP1TSHR
Propylene Glycol Diacetate SCHEMBL5977724 0.86 ALDH1A1 (0.37) ALDH1A1LMNAHSD17B10TDP1TSHR
Propylene Glycol Diacetate SCHEMBL107826 0.86 ALDH1A1 (0.43) ALDH1A1LMNAHSD17B10TDP1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10222699-B2 Compositions and processes for immersion lithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-05 US disclosed
EP-2056162-B1 Process for immersion lithography ROHM & HAAS ELECT MAT (US) 2016-05-04 EP disclosed
US-20150044609-A1 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-02-12 US disclosed
US-8871428-B2 Compositions and processes for immersion lithography ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) 2014-10-28 US disclosed
US-20130065178-A1 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-03-14 US disclosed
US-8257902-B2 Compositons and processes for immersion lithography U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2012-09-04 US disclosed
US-20090117489-A1 Compositons and processes for immersion lithography ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) 2009-05-07 US disclosed
EP-2056162-A1 Compositions and processes for immersion lithography Rohm and Haas Electronic Materials LLC (US) 2009-05-06 EP disclosed
US-7026101-B2 Antireflective coating compositions SHIPLEY COMPANY, LLC (US) 2006-04-11 US disclosed
US-20020031729-A1 Antireflective coating compositions SHIPLEY COMPANY, L.L.C. 2002-03-14 US disclosed
EP-1178354-A1 Antireflective coating compositions Shipley Company LLC (US) 2002-02-06 EP disclosed