⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20522631 | 0.86 | ADH1B (0.30) | — | |
| SCHEMBL888678 | 0.79 | TSHR (0.45) | — | |
| SCHEMBL12228805 | 0.74 | — | — | |
| SCHEMBL28297712 | 0.72 | — | — | |
| SCHEMBL18991388 | 0.72 | — | — | |
| SCHEMBL17046200 | 0.72 | — | — | |
| SCHEMBL16582927 | 0.67 | — | — | |
| SCHEMBL21461402 | 0.67 | — | — | |
| SCHEMBL21461448 | 0.67 | — | — | |
| SCHEMBL12192522 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 325 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12604684-B2 | Method and system for mitigating underlayer damage during formation of patterned structures | ASM IP HOLDING B.V. (NL) | 2026-04-14 | — | — | US | claimed |
| US-12518966-B2 | Selective plasma enhanced atomic layer deposition | VERSUM MATERIALS US, LLC (US) | 2026-01-06 | — | — | US | claimed |
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | claimed |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | claimed |
| US-12378667-B2 | Methods and systems for forming doped silicon nitride films | ASM IP HOLDING B.V. (NL) | 2025-08-05 | — | — | US | claimed |
| US-20250166990-A1 | METHOD FOR FORMING INSULATING FILM, AND SUBSTRATE PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2025-05-22 | — | — | US | claimed |
| US-12276021-B2 | Methods of forming phosphosilicate glass layers, structures formed using the methods and systems for performing the methods | ASM IP HOLDING B.V. (NL) | 2025-04-15 | — | — | US | claimed |
| US-20250054747-A1 | CONFORMAL DEPOSITION OF SILICON NITRIDE | LAM RES CORP (US) | 2025-02-13 | — | — | US | claimed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| US-20240321571-A1 | INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2024-09-26 | — | — | US | claimed |
| EP-2484801-B1 | Method of deposition of Al2O3/SiO2 stacks, from TMA or TEA and silicon precursors | AIR LIQUIDE (FR) | 2017-08-23 | — | — | EP | claimed |
| US-20170125732-A1 | Flexible Organic Light Emitting Display Device and Method of Fabricating the Same | LG DISPLAY CO., LTD. (KR) | 2017-05-04 | — | — | US | claimed |
| EP-2484802-B1 | Method of deposition of Al2O3/SiO2 stacks from DMAI and silicon precursors | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2017-03-29 | — | — | EP | claimed |
| EP-2484803-B1 | Method of deposition of Al2O3/SiO2 stacks, from aluminium and silicon precursors | AIR LIQUIDE (FR) | 2017-03-29 | — | — | EP | claimed |
| WO-2016144960-A1 | PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-09-15 | — | — | WO | claimed |
| US-9111897-B2 | Methods of forming a polysilicon layer and methods of manufacturing semiconductor devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-08-18 | — | — | US | claimed |
| EP-2484802-A1 | Method of deposition of Al2O3/SiO2 stacks from DMAI and silicon precursors | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2012-08-08 | — | — | EP | claimed |
| EP-2484801-A1 | Method of deposition of Al2O3/SiO2 stacks, from TMA or TEA and silicon precursors | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2012-08-08 | — | — | EP | claimed |
| US-20100009546-A1 | Aminosilanes for Shallow Trench Isolation Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-01-14 | — | — | US | claimed |
| EP-2144279-A2 | Aminosilanes for shallow trench isolation films | Air Products and Chemicals, Inc. (US) | 2010-01-13 | — | — | EP | claimed |