Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | ADH1B | P00325 | 2/20 | 0.39 |
| ▸ | ADH1C | P00326 | 2/20 | 0.39 |
| ▸ | ADH1A | P07327 | 2/20 | 0.39 |
| ▸ | ADH7 | P40394 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 6/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | ACHE | P22303 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | ADH4 | P08319 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17409612 | 0.80 | TSHR (0.45) | TSHRALDH1A1CA1CA2ADH1B | |
| SCHEMBL49455 | 0.79 | — | — | |
| SCHEMBL8952658 | 0.78 | — | — | |
| SCHEMBL18991366 | 0.75 | — | — | |
| SCHEMBL17046176 | 0.75 | — | — | |
| SCHEMBL22342226 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL1780608 | 0.73 | TSHR (0.39) | TSHRALDH1A1CA1CA2ADH1B | |
| SCHEMBL20130854 | 0.73 | TSHR (0.39) | TSHRALDH1A1CA1CA2ADH1B | |
| SCHEMBL18991638 | 0.71 | — | — | |
| SCHEMBL20130879 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | claimed |
| US-12378667-B2 | Methods and systems for forming doped silicon nitride films | ASM IP HOLDING B.V. (NL) | 2025-08-05 | — | — | US | claimed |
| US-20230126516-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2023-04-27 | — | — | US | claimed |
| US-20230089397-A1 | AIR GAP FORMING METHOD AND SELECTIVE DEPOSITION METHOD | ASM IP HOLDING B.V. (NL) | 2023-03-23 | — | — | US | claimed |
| EP-1678746-B1 | Method for forming a dielectric on a copper-containing metallisation | INFINEON TECHNOLOGIES AG (DE) | 2011-11-30 | — | — | EP | claimed |
| US-20060252240-A1 | Process for forming a dielectric on a copper-containing metallization and capacitor arrangement | INFINEON TECHNOLOGIES AG (DE) | 2006-11-09 | — | — | US | claimed |
| US-12588434-B2 | Methods for forming dielectric materials with selected polarization for semiconductor devices | TOKYO ELECTRON LIMITED (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | disclosed |
| US-12378667-B2 | Methods and systems for forming doped silicon nitride films | ASM IP HOLDING B.V. (NL) | 2025-08-05 | — | — | US | disclosed |
| CN-119895076-A | Method for depositing silicon-based dielectric film | 应用材料公司 | 2025-04-25 | — | — | CN | disclosed |
| CN-119776805-A | Modified silicon nitride film and preparation method and application thereof | 大连恒坤新材料有限公司 | 2025-04-08 | — | — | CN | disclosed |
| CN-114250453-B | Substrate processing apparatus and method for manufacturing semiconductor device | 株式会社国际电气 | 2024-07-19 | — | — | CN | disclosed |
| CN-114250452-B | Substrate processing apparatus, method for manufacturing semiconductor device, and substrate processing method | 株式会社国际电气 | 2024-07-05 | — | — | CN | disclosed |
| US-7875521-B2 | Semiconductor device and production method thereof | FUJITSU SEMICONDUCTOR LIMITED (JP) | 2011-01-25 | — | — | US | disclosed |
| US-20100129971-A1 | SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREOF | FUJITSU MICROELECTRONICS LIMITED (JP) | 2010-05-27 | — | — | US | disclosed |
| US-7683362-B2 | Semiconductor device and production method thereof | FUJITSU MICROELECTRONICS LIMITED (JP) | 2010-03-23 | — | — | US | disclosed |
| US-7678641-B2 | Semiconductor device and fabrication process thereof | FUJITSU MICROELECTRONICS LIMITED (JP) | 2010-03-16 | — | — | US | disclosed |
| US-20090280612-A1 | Semiconductor device and production method thereof | FUJITSU MICROELECTRONICS LIMITED (JP) | 2009-11-12 | — | — | US | disclosed |
| US-7579617-B2 | Semiconductor device and production method thereof | FUJITSU MICROELECTRONICS LIMITED (JP) | 2009-08-25 | — | — | US | disclosed |
| US-20070012913-A1 | Semiconductor device and production method thereof | FUJITSU LIMITED (JP) | 2007-01-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12588434-B2 | Methods for forming dielectric materials with selected polarization for semiconductor devices | PIEZO1, STAU1, ZRANB2 | TSHR 3557/4885ALDH1A1 3199/4885CA1 74/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.