Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | LTB4R | Q15722 | 2/20 | 0.33 |
| ▸ | LTB4R2 | Q9NPC1 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | PDK2 | Q15119 | 2/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4956473 | 0.95 | TDP1 (0.37) | ESR1ESR2THRBL3MBTL1MAPT | |
| SCHEMBL6321833 | 0.94 | PPARG (0.36) | ESR1ESR2THRBTSHR | |
| SCHEMBL15356213 | 0.92 | TSHR (0.37) | ESR1ESR2THRBL3MBTL1MAPT | |
| SCHEMBL28295187 | 0.92 | ESR1 (0.36) | ESR1ESR2THRBMAPTKDM4E | |
| SCHEMBL4955324 | 0.90 | ESR1 (0.38) | ESR1ESR2MAPTKDM4EPOLB | |
| SCHEMBL819025 | 0.90 | ESR1 (0.39) | ESR1ESR2THRBL3MBTL1MAPT | |
| SCHEMBL6322728 | 0.90 | PPARG (0.39) | ESR1ESR2POLBAPEX1HTT | |
| SCHEMBL2231834 | 0.88 | ESR1 (0.46) | ESR1ESR2THRBL3MBTL1MAPT | |
| SCHEMBL15356210 | 0.88 | POLB (0.39) | POLBAPEX1HTTTDP1TSHR | |
| SCHEMBL19009924 | 0.87 | THRB (0.38) | ESR1ESR2THRBMAPTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023188978-A1 | CURABLE COMPOSITION, CURED PRODUCT, MOLDED BODY, AND OPTICAL MATERIAL | 三井化学株式会社 | 2023-10-05 | — | — | WO | claimed |
| WO-2023188978-A1 | CURABLE COMPOSITION, CURED PRODUCT, MOLDED BODY, AND OPTICAL MATERIAL | 三井化学株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-10611869-B2 | Curable composition and cured product | AGC Inc. (JP) | 2020-04-07 | — | — | US | disclosed |
| US-20190218325-A1 | CURABLE COMPOSITION AND CURED PRODUCT | AGC Inc. (JP) | 2019-07-18 | — | — | US | disclosed |
| US-9574106-B2 | Optical element material and method for producing same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2017-02-21 | — | — | US | disclosed |
| US-9574106-B2 | Optical element material and method for producing same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2017-02-21 | — | — | US | disclosed |
| US-9399693-B2 | Resin composition for photoimprinting, pattern forming process and etching mask | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2016-07-26 | — | — | US | disclosed |
| US-9399693-B2 | Resin composition for photoimprinting, pattern forming process and etching mask | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2016-07-26 | — | — | US | disclosed |
| US-20140287219-A1 | OPTICAL ELEMENT MATERIAL AND METHOD FOR PRODUCING SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140287219-A1 | OPTICAL ELEMENT MATERIAL AND METHOD FOR PRODUCING SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20130288021-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20130288021-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-7361432-B2 | Composition for hologram-recording material, hologram-recording medium, and process for producing the same | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-04-22 | — | — | US | disclosed |
| US-20050185232-A1 | Volume hologram recording photosensitive composition and its use | NIPPON PAINT CO., LTD. (JP) | 2005-08-25 | — | — | US | disclosed |
| US-20040096776-A1 | Composition for hologram-recording material, hologram-recording medium, and process for producing the same | Daiso, Co., Ltd. (JP) | 2004-05-20 | — | — | US | disclosed |
| EP-1376268-A1 | COMPOSITION FOR HOLOGRAM-RECORDING MATERIAL, HOLOGRAM-RECORDING MEDIUM, AND PROCESS FOR PRODUCING THE SAME | National Institute of Advanced Industrial Science and Technology (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030096172-A1 | Hologram recording material composition and hologram recording medium | DAISO CO., LTD. (JP) | 2003-05-22 | — | — | US | disclosed |