Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGLL | Q99685 | 2/20 | 0.33 |
| ▸ | GSK3A | P49840 | 1/20 | 0.33 |
| ▸ | GSK3B | P49841 | 1/20 | 0.33 |
| ▸ | FAAH | O00519 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11001975 | 0.81 | MGLL (0.55) | MGLLFAAH | |
| SCHEMBL4955271 | 0.70 | MGLL (0.38) | MGLLGSK3AGSK3BFAAH | |
| SCHEMBL28572221 | 0.67 | MGLL (0.42) | MGLLGSK3AGSK3BFAAH | |
| SCHEMBL9407360 | 0.67 | MGLL (0.42) | MGLLGSK3AGSK3BFAAH | |
| SCHEMBL1664700 | 0.63 | — | — | |
| SCHEMBL28379307 | 0.63 | — | — | |
| SCHEMBL9777831 | 0.63 | — | — | |
| SCHEMBL15577150 | 0.61 | MGLL (0.38) | MGLLGSK3AGSK3BFAAH | |
| SCHEMBL16377382 | 0.59 | MGLL (0.35) | MGLLGSK3AGSK3BFAAH | |
| SCHEMBL2359893 | 0.59 | MGLL (0.35) | MGLLGSK3AGSK3BFAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6337375-B1 | RESIN WITH COLOR AND FLUORESCING AGENT | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-01-08 | — | — | US | claimed |
| US-6190759-B1 | ELECTRONIC PACKAGE COMPRISING DIELECTRIC LAYER AND CONDUCTIVE LAYER, SAID DIELECTRIC LAYER INCLUDING REINFORCING MATERIAL, RESIN MATERIAL SELECTED FROM EPOXY, CYANATE AND BISMALEIMIDE RESINS, COLORING AGENT, AND FLUORESCING AGENT | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-02-20 | — | — | US | claimed |
| US-6187417-B1 | Substrate having high optical contrast and method of making same | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-02-13 | — | — | US | claimed |
| US-4503186-A | PRINTED CIRCUITS, SOLVENT-RESISTANT THERMOPLASTIC | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1985-03-05 | — | — | US | claimed |
| US-4404330-A | ACRYLONITRILE-BUTADIENE COPOLYMER OR TERPOLYMER AND CYANATE ESTER COMPOUNDS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1983-09-13 | — | — | US | claimed |
| US-4403073-A | MODIFIED POLYBUTADIENE AND ISOCYANATE ESTER; HEAT RESISTANCE; FLEXIBILITY; ELASTICITY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1983-09-06 | — | — | US | claimed |
| US-4396745-A | POLYFUNCTIONAL AROMATIC CYANATE, RUBBER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1983-08-02 | — | — | US | claimed |
| US-4396679-A | Plastic articles suitable for electroless plating | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1983-08-02 | — | — | US | claimed |
| US-4383903-A | POLYFUNCTIONAL AROMATIC CYANATE, ACRYLIC COMPOUND, POLYFUNCTIONAL MALEIMIDE, PHOTOINITIATOR | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1983-05-17 | — | — | US | claimed |
| US-20080200636-A1 | Epoxy Resin, Hardenable Resin Composition Containing the Same and Use Thereof | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2008-08-21 | — | — | US | disclosed |
| EP-1852451-A1 | EPOXY RESIN, HARDENABLE RESIN COMPOSITION CONTAINING THE SAME AND USE THEREOF | Nippon Kayaku Kabushiki Kaisha (JP) | 2007-11-07 | — | — | EP | disclosed |
| US-6337375-B1 | RESIN WITH COLOR AND FLUORESCING AGENT | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-01-08 | — | — | US | disclosed |
| US-6190759-B1 | ELECTRONIC PACKAGE COMPRISING DIELECTRIC LAYER AND CONDUCTIVE LAYER, SAID DIELECTRIC LAYER INCLUDING REINFORCING MATERIAL, RESIN MATERIAL SELECTED FROM EPOXY, CYANATE AND BISMALEIMIDE RESINS, COLORING AGENT, AND FLUORESCING AGENT | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-02-20 | — | — | US | disclosed |
| US-6187417-B1 | Substrate having high optical contrast and method of making same | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-02-13 | — | — | US | disclosed |
| US-4740343-A | Method for producing rigid resin molds | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1988-04-26 | — | — | US | disclosed |
| US-4717609-A | CYANATE ESTER COMPOUND OR PREPOLYMER THEREOF; THERMOPLASTIC, SATURATED, AMORPHOUS POLYESTER RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1988-01-05 | — | — | US | disclosed |
| US-4645805-A | HEAT, MOISTURE, CHEMICAL RESISTANCE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1987-02-24 | — | — | US | disclosed |
| US-4585855-A | LIQUID, WORKABILITY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1986-04-29 | — | — | US | disclosed |
| US-4503186-A | PRINTED CIRCUITS, SOLVENT-RESISTANT THERMOPLASTIC | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1985-03-05 | — | — | US | disclosed |
| US-4496695-A | POLYPHENYLENE ETHER RESIN AN EPOXY COMPOUND, PLUS A MALEIMIDE AND OR CYANATE ESTER COMPONENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1985-01-29 | — | — | US | disclosed |