⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16284806 | 0.74 | — | — | |
| SCHEMBL22589391 | 0.74 | — | — | |
| SCHEMBL2025023 | 0.73 | — | — | |
| SCHEMBL16284817 | 0.71 | — | — | |
| SCHEMBL430721 | 0.71 | — | — | |
| SCHEMBL377532 | 0.71 | — | — | |
| SCHEMBL17721697 | 0.69 | — | — | |
| SCHEMBL2104186 | 0.69 | — | — | |
| SCHEMBL17338715 | 0.69 | — | — | |
| SCHEMBL25220941 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2336 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260139200-A1 | COMPOSITIONS AND METHODS FOR VAPOR PHASE SURFACE MODIFICATION | FUJIFILM ELECTRONIC MAT U S A INC (US) | 2026-05-21 | — | — | US | claimed |
| US-20260136856-A1 | METHOD AND SYSTEM FOR FORMING SILICON NITRIDE ON A SIDEWALL OF A FEATURE | ASM IP HOLDING BV (NL) | 2026-05-14 | — | — | US | claimed |
| US-20260136853-A1 | REMOVING OR PREVENTING RESIDUE SUBSEQUENT TO REPAIRING LOW-K MATERIALS | APPLIED MATERIALS, INC. (US) | 2026-05-14 | — | — | US | claimed |
| US-20260123314-A1 | PROTECTIVE FILM FORMING AGENT FOR SILICON-BASED SUBSTRATE, METHOD FOR PROCESSING SILICON-BASED SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2026-04-30 | — | — | US | claimed |
| US-20260123302-A1 | METHOD AND APPARATUS FOR DEPOSITING A CARBON-CONTAINING MATERIAL | ASM IP HOLDING BV (NL) | 2026-04-30 | — | — | US | claimed |
| US-20260110963-A1 | PHOTORESIST COMPOSITION, PATTERN FORMING METHOD USING NEAR-FIELD SURFACE LAYER IMAGING, AND DEPOSITION DEVICE | INST OPTICS & ELECTRONICS CAS (CN) | 2026-04-23 | — | — | US | claimed |
| US-12604651-B2 | Rapid fabrication of semiconductor thin films | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2026-04-14 | — | — | US | claimed |
| US-12598977-B2 | Fill of vias in single and dual damascene structures using self-assembled monolayer | INTEL CORPORATION (US) | 2026-04-07 | — | — | US | claimed |
| US-12588435-B2 | Selective inhibition for selective metal deposition | TOKYO ELECTRON LIMITED (JP) | 2026-03-24 | — | — | US | claimed |
| US-12557370-B2 | Semiconductor device manufacturing method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-02-17 | — | — | US | claimed |
| EP-0184567-B1 | PROCESS FOR THE FORMATION OF NEGATIVE PATTERNS IN A PHOTORESIST LAYER | UCB Electronics, S.A. (BE) | 1989-12-13 | — | — | EP | claimed |
| US-4885262-A | Chemical modification of spin-on glass for improved performance in IC fabrication | INTEL CORPORATION (US) | 1989-12-05 | — | — | US | claimed |
| US-4778871-A | SILPHENYLENE-VINYLMETHYLSILOXANE ELASTOMER CURED WITH MIXTURE HYDROSILYLATION AND URETHANE CURING AGENTS | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1988-10-18 | — | — | US | claimed |
| EP-0274757-A2 | Bilayer lithographic process | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1988-07-20 | — | — | EP | claimed |
| US-4491669-A | Mixed alkoxyaminosilanes, methods of making same and vulcanizing silicons prepared therefrom | PETRARCH SYSTEMS INC. (US) | 1985-01-01 | — | — | US | claimed |
| US-4412874-A | Silane ballistic modifier containing propellant | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) | 1983-11-01 | — | — | US | claimed |
| US-4412073-A | Isocyanurate preparation by catalytic, aminosilyl initiated cyclotrimerization of isocyanates | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1983-10-25 | — | — | US | claimed |
| US-4379067-A | Self-sealing refrigerant | Packo, Joseph J. (US) | 1983-04-05 | — | — | US | claimed |
| US-4304805-A | Sealing leaks by polymerization of volatilized aminosilane monomers | Packo, Joseph J. (US) | 1981-12-08 | — | — | US | claimed |
| US-4237172-A | Sealing leaks by polymerization of volatilized aminosilane monomers | Packo, Joseph J. (US) | 1980-12-02 | — | — | US | claimed |