SCHEMBL377532

SCHEMBL377532

CN(C)[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27688918 0.85
SCHEMBL430721 0.75
SCHEMBL21359830 0.73
SCHEMBL234175 0.71
SCHEMBL7266312 0.71
SCHEMBL25220941 0.71
SCHEMBL49557 0.71
SCHEMBL9014234 0.71
SCHEMBL22589391 0.69
SCHEMBL232898 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 5335 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260139200-A1 COMPOSITIONS AND METHODS FOR VAPOR PHASE SURFACE MODIFICATION FUJIFILM ELECTRONIC MAT U S A INC (US) 2026-05-21 US claimed
US-20260144026-A1 SURFACE INHIBITION TO REDUCE BOTTOM UP OXIDE DEPOSITION IN VERTICAL TRENCH APPLIED MAT INC (US) 2026-05-21 US claimed
US-20260136853-A1 REMOVING OR PREVENTING RESIDUE SUBSEQUENT TO REPAIRING LOW-K MATERIALS APPLIED MATERIALS, INC. (US) 2026-05-14 US claimed
US-12628623-B2 Selective deposition for sub 20 nm pitch EUV patterning APPLIED MATERIALS, INC. (US) 2026-05-12 US claimed
US-20260123314-A1 PROTECTIVE FILM FORMING AGENT FOR SILICON-BASED SUBSTRATE, METHOD FOR PROCESSING SILICON-BASED SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE TOKYO OHKA KOGYO CO LTD (JP) 2026-04-30 US claimed
US-20260110963-A1 PHOTORESIST COMPOSITION, PATTERN FORMING METHOD USING NEAR-FIELD SURFACE LAYER IMAGING, AND DEPOSITION DEVICE INST OPTICS & ELECTRONICS CAS (CN) 2026-04-23 US claimed
US-20260101682-A1 SELECTIVE DEPOSITION METHOD OF THIN FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE HONGIK UNIVERSITY INDUSTRY-ACADEMIA COOPERATION FOUNDATION (KR) 2026-04-09 US claimed
EP-4721878-A2 USE OF VAPOR DEPOSITION COATED FLOW PATHS FOR IMPROVED CHROMATOGRAPHY OF METAL INTERACTING ANALYTES Waters Technologies Corporation (US) 2026-04-08 EP claimed
US-12598977-B2 Fill of vias in single and dual damascene structures using self-assembled monolayer INTEL CORPORATION (US) 2026-04-07 US claimed
US-20260092905-A1 USE OF VAPOR DEPOSITION COATED FLOW PATHS FOR IMPROVED CHROMATOGRAPHY OF METAL INTERACTING ANALYTES WATERS TECHNOLOGIES CORPORATION (US) 2026-04-02 US claimed
US-4657845-A Positive tone oxygen plasma developable photoresist INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1987-04-14 US claimed
EP-0212630-A2 Compositions based on water-curable thermoplastic polymers and metal carboxylate silanol condensation catalysts UNION CARBIDE CORPORATION (US) 1987-03-04 EP claimed
EP-0184567-A1 Process for the formation of negative patterns in a photoresist layer UCB Electronics, S.A. (BE) 1986-06-11 EP claimed
US-4533369-A POLYMERIC MEMBRANE AND TERTIARY CARBON OR TERTIARY ORGANIC SILICONCONTAINING COMPOUND ON ONE SIDE SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1985-08-06 US claimed
US-4412073-A Isocyanurate preparation by catalytic, aminosilyl initiated cyclotrimerization of isocyanates RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1983-10-25 US claimed
US-4374275-A Ketoenamine pyrethroid intermediates SHELL OIL COMPANY (US) 1983-02-15 US claimed
US-4324915-A Ketoenamine pyrethroid intermediates SHELL OIL COMPANY (US) 1982-04-13 US claimed
US-4092163-A Imaging process utilizing silylated coated carrier XEROX CORPORATION (US) 1978-05-30 US claimed
US-4070186-A Tribo modified toner materials via silylation and electrostatographic imaging process XEROX CORPORATION (US) 1978-01-24 US claimed
US-4043929-A Electrostatographic carrier composition XEROX CORPORATION (US) 1977-08-23 US claimed