SCHEMBL430721

SCHEMBL430721

CN(C)[Si](C)(N(C)C)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL377532 0.75
SCHEMBL25220941 0.71
SCHEMBL9014234 0.71
SCHEMBL49557 0.71
SCHEMBL11150558 0.67
SCHEMBL2524116 0.67
SCHEMBL2099803 0.67
SCHEMBL2524347 0.67
SCHEMBL303170 0.67
SCHEMBL19426996 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 822 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12521756-B2 Protective coating HZO, INC. 2026-01-13 US claimed
US-20250320604-A1 LOW TEMPERATURE PLASMA DEPOSITION OF SILICON-CONTAINING FILMS USING HYDROGEN PEROXIDE GELEST INC (US) 2025-10-16 US claimed
US-20250305131-A1 LOW TEMPERATURE THERMAL DEPOSITION OF SILICON-CONTAINING FILMS USING LOW WATER CONTENT HYDROGEN PEROXIDE GELEST, INC. 2025-10-02 US claimed
US-12421603-B2 Composition for high temperature atomic layer deposition of high quality silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2025-09-23 US claimed
US-20250218947-A1 INTERCONNECTOR, ELECTRONIC APPARATUS INCLUDING THE INTERCONNECTOR, AND METHOD OF MANUFACTURING THE INTERCONNECTOR SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-07-03 US claimed
CN-119900018-A Composition for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2025-04-29 CN claimed
WO-2025038583-A9 STABILIZED ORGANOSILANE COMPOSITIONS AND METHODS OF USING SAME TO FORM DENSE LOW-K FILMS VERSUM MATERIALS US, LLC (US) 2025-04-17 WO claimed
WO-2025038583-A1 STABILIZED ORGANOSILANE COMPOSITIONS AND METHODS OF USING SAME TO FORM DENSE LOW-K FILMS VERSUM MATERIALS US, LLC (US) 2025-02-20 WO claimed
EP-3269756-B1 TEMPERATURE-RESISTANT SILICONE RESINS BOEING CO (US) 2024-09-11 EP claimed
EP-4358119-A2 IMPROVED SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE Applied Materials, Inc. (US) 2024-04-24 EP claimed
US-5380769-A Curable compositions TEKTRONIX INC. (US) 1995-01-10 US claimed
EP-0604024-A2 Reactive ink compositions and system TEKTRONIX, INC. (US) 1994-06-29 EP claimed
EP-0540084-A1 Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons ENICHEM S.p.A. (IT) 1993-05-05 EP claimed
US-5208069-A Silane precursor ISTITUTO GUIDO DONEGANI S.P.A. (IT) 1993-05-04 US claimed
US-5061301-A Sulfonating polysulfone membrane followed by grafting with polysiloxanes and crosslinking KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1991-10-29 US claimed
EP-0189839-B1 PROCESS FOR PREPARING TRIACETOXYSILANES FORM TRIS(AMINO)SILANES UNION CARBIDE CORPORATION (US) 1989-03-15 EP claimed
EP-0189839-A1 Process for preparing triacetoxysilanes form tris(amino)silanes UNION CARBIDE CORPORATION (US) 1986-08-06 EP claimed
US-4556725-A Process for preparing triacetoxysilanes from tris(amino)silanes UNION CARBIDE CORPORATION (US) 1985-12-03 US claimed
US-4379067-A Self-sealing refrigerant Packo, Joseph J. (US) 1983-04-05 US claimed
US-4237172-A Sealing leaks by polymerization of volatilized aminosilane monomers Packo, Joseph J. (US) 1980-12-02 US claimed