SCHEMBL4958424

SCHEMBL4958424

NC1CCCC(N)C1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19400484 0.81
SCHEMBL19896899 0.81
SCHEMBL21964325 0.81
SCHEMBL8920620 0.81
SCHEMBL3965857 0.75 SIRT2 (0.32)
Hydrochloric Acid SCHEMBL3971166 0.74 SIRT2 (0.31)
SCHEMBL14275888 0.70 NOS3 (0.42)
SCHEMBL3630111 0.69
SCHEMBL13640234 0.69
SCHEMBL20979414 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240067611-A1 PHENYL CYCLOHEXANONE DERIVATIVES AND METHODS OF MAKING AND USING THEM SPIRIFY PHARMA INC. 2024-02-29 US disclosed
US-11827606-B2 Phenyl cyclohexanone derivatives and methods of making and using them SPIRIFY PHARMA INC. (US) 2023-11-28 US disclosed
EP-1321487-B1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE MITSUI CHEMICALS INC (JP) 2008-02-27 EP disclosed
US-6710160-B2 VARNISH HAVING IMPROVED SMOOTHNESS, THERMAL RESISTANCE, MELT FLOWABILITY, OPTICAL PROPERTIES AND CHEMICAL RESISTANCE; DIELECTRICS MITSUI CHEMICALS, INC. (JP) 2004-03-23 US disclosed
EP-1321487-A1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE Mitsui Chemicals, Inc. (JP) 2003-06-25 EP disclosed
US-20020188090-A1 Polyamic acid, polyimide, process for producing these, and film of the polyimide MITSUI CHEMICALS, INC. (JP) 2002-12-12 US disclosed