Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.52 |
| ▸ | HPGDS | O60760 | 1/20 | 0.42 |
| ▸ | MTOR | P42345 | 1/20 | 0.42 |
| ▸ | ADK | P55263 | 1/20 | 0.42 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.42 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.42 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 2/20 | 0.42 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.42 |
| ▸ | DCUN1D1 | Q96GG9 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.40 |
| ▸ | RAB9A | P51151 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phosphine SCHEMBL28142196 | 0.98 | GAA (0.50) | GAAMAPTHPGDSMTORADK | |
| SCHEMBL28329121 | 0.94 | GAA (0.47) | GAAMAPTHPGDSMTORADK | |
| Pyridine SCHEMBL28941369 | 0.91 | GAA (0.45) | GAAMAPTHPGDSMTORADK | |
| Pyrrole SCHEMBL28207656 | 0.91 | MAPT (0.45) | GAAMAPTHPGDSMTORADK | |
| SCHEMBL28201939 | 0.89 | GAA (0.44) | GAAMAPTHPGDSMTORADK | |
| Carbamic Acid SCHEMBL29249439 | 0.89 | MAPT (0.47) | GAAMAPTPOLBPIN1KDM4E | |
| SCHEMBL27985279 | 0.89 | MAPK1 (0.40) | GAAMAPTHPGDSNISCHNR1H2 | |
| Octane SCHEMBL28114785 | 0.88 | GAA (0.42) | GAAMAPTNR1H3 | |
| 2-Phenylimidazole SCHEMBL16347705 | 0.86 | NISCH (0.68) | GAAMAPTHPGDSMTORADK | |
| SCHEMBL1264137 | 0.84 | DCUN1D1 (0.47) | GAAMAPTHPGDSNISCHDCUN1D1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 14936 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122080827-A | Adhesive film composition for reworking backing plate and preparation method thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-122059878-A | Bio-based latency accelerator and preparation method and application thereof | 深圳先进电子材料国际创新研究院 | 2026-05-19 | — | — | CN | claimed |
| CN-121574687-A | Conductive adhesive and preparation method and application thereof | 深圳田十精材技术有限公司 | 2026-02-27 | — | — | CN | claimed |
| WO-2025224106-A1 | USE OF A COMPOSITION OR THERMOSETTING RESIN OR THERMOSET POLYMER MADE THEREFROM AS BUILD-UP FILM MATERIAL IN A PRINTED CIRCUIT ELEMENT | BASF SE (DE) | 2025-10-30 | — | — | WO | claimed |
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| CN-120195934-A | Low-temperature negative photoresist composition | 深圳迪道微电子科技有限公司 | 2025-06-24 | — | — | CN | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| US-12331239-B2 | Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt | BASF SE (DE) | 2025-06-17 | — | — | US | claimed |
| WO-2025108836-A1 | COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF | MERCK PATENT GMBH (DE) | 2025-05-30 | — | — | WO | claimed |
| CN-120032941-A | Conductive paste and preparation method of antioxidant copper powder in conductive paste | 西北工业大学 | 2025-05-23 | — | — | CN | claimed |
| US-4933213-A | Crosslinking process | SOCIETE CHIMIQUE DES CHARBONNAGES S.A. (FR) | 1990-06-12 | — | — | US | claimed |
| US-4925901-A | STORAGE STAABILITY, ONIUM ION CATALYST | THE DOW CHEMICAL COMPANY (US) | 1990-05-15 | — | — | US | claimed |
| US-4662905-A | REACTION PRODUCT OF COPPER SALT AND AN IMIDAZOLE, PYRAZOLE, TRIAZOLE, OR TETRAZOLE | Itaru Todoriki, Director of Agency of Industrial Science and Technology (JP) | 1987-05-05 | — | — | US | claimed |
| US-4658009-A | Novel 2-substituted-4,6-diamino-s-triazine/isocyanuric acid adduct, process for synthesis of said adduct and process for curing polyepoxy resin with said adduct | SHIKOKU CHEMICALS CORPORATION (JP) | 1987-04-14 | — | — | US | claimed |
| US-4650740-A | DIAZONIUM SALT AND COUPLER | FUJI PHOTO FILM CO., LTD. (JP) | 1987-03-17 | — | — | US | claimed |
| EP-0194895-A2 | 2-substituted-4, 6-diamino-s-triazine/isocyanuric acid adduct, process for synthesis of said adduct and process for curing polyepoxy resin with said adduct | SHIKOKU CHEMICALS CORPORATION (JP) | 1986-09-17 | — | — | EP | claimed |
| US-4546155-A | ADDUCT OF EPOXY COMPOUND, TERTIARY AMINE COMPOUND, AND CARBOXYLIC ACID ANHYDRIDE | AJINOMOTO CO., INC. (JP) | 1985-10-08 | — | — | US | claimed |
| US-4294950-A | POLYVALENT CARBOXYLIC ACID BONDED THERETO | ITO OPTICAL INDUSTRIAL CO., LTD. (JP) | 1981-10-13 | — | — | US | claimed |
| US-4168171-A | Light-sensitive thermal developable diazotype sheets with imidazoles | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1979-09-18 | — | — | US | claimed |
| US-4026872-A | PHENOLIC CURING AGENTS | HITACHI, LTD. (JA) | 1977-05-31 | — | — | US | claimed |