Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | FAAH | O00519 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
| ▸ | PNMT | P11086 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | MAOA | P21397 | 1/20 | 0.30 |
| ▸ | MAOB | P27338 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30206769 | 1.00 | TP53 (0.48) | TP53TDP1TSHRALDH1A1FAAH | |
| Styrene SCHEMBL29141820 | 0.94 | ALDH1A1 (0.54) | TP53TDP1TSHRALDH1A1FAAH | |
| SCHEMBL3869027 | 0.92 | TP53 (0.42) | TP53TDP1TSHRALDH1A1FAAH | |
| SCHEMBL28125654 | 0.85 | ALDH1A1 (0.39) | TP53TDP1TSHRALDH1A1FAAH | |
| SCHEMBL809439 | 0.83 | TP53 (0.45) | TP53TDP1TSHRALDH1A1FAAH | |
| SCHEMBL29375309 | 0.82 | TP53 (0.52) | TP53TDP1TSHRALDH1A1FAAH | |
| SCHEMBL595016 | 0.82 | TP53 (0.52) | TP53TDP1TSHRALDH1A1FAAH | |
| SCHEMBL595537 | 0.82 | TP53 (0.52) | TP53TDP1TSHRALDH1A1FAAH | |
| SCHEMBL14761019 | 0.80 | TP53 (0.42) | TP53TDP1TSHRALDH1A1FAAH | |
| SCHEMBL27715153 | 0.80 | TP53 (0.42) | TP53TDP1TSHRALDH1A1FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3084 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4119568-B1 | NOVEL METALLOCENE COMPOUND, CATALYST COMPOSITION COMPRISING THE SAME, AND METHOD FOR PREPARING OLEFIN POLYMER USING THE SAME | LG CHEMICAL LTD (KR) | 2026-05-20 | — | — | EP | claimed |
| US-12617881-B2 | Metallocene compound, catalyst composition comprising the same, and method for preparing olefin polymer using the same | LG CHEM, LTD. (KR) | 2026-05-05 | — | — | US | claimed |
| EP-4717717-A1 | POLYOLEFIN COMPOSITION | LG Chem, Ltd. (KR) | 2026-04-01 | — | — | EP | claimed |
| US-20260055219-A1 | ULTRA-LOW LOSS HYDROCARBON RESIN COMPOSITION | HUNTSMAN ADV MAT SWITZERLAND (CH) | 2026-02-26 | — | — | US | claimed |
| US-12460029-B2 | Polyolefin | LG CHEM, LTD. (KR) | 2025-11-04 | — | — | US | claimed |
| US-20250297100-A1 | UNSATURATED CARBON-CONTAINING THERMOSETTING RESIN AND MANUFACTURING METHOD THEREOF | E-RAY OPTOELECTRONICS TECHNOLOGY CO., LTD. (TW) | 2025-09-25 | — | — | US | claimed |
| EP-4577590-A1 | ULTRA-LOW LOSS HYDROCARBON RESIN COMPOSITION | Huntsman Advanced Materials (Switzerland) GmbH (CH) | 2025-07-02 | — | — | EP | claimed |
| US-12319761-B2 | Olefin-based polymer | LG CHEM, LTD. (KR) | 2025-06-03 | — | — | US | claimed |
| CN-115443283-B | Novel metallocene compound, catalyst composition comprising the same, and method for preparing olefin polymer using the same | 株式会社LG化学 | 2025-05-06 | — | — | CN | claimed |
| EP-3246343-B1 | METHOD FOR PREPARING POLYOLEFIN | LG CHEMICAL LTD (KR) | 2025-04-09 | — | — | EP | claimed |
| EP-0334906-B1 | SILICON-CONTAINING NEGATIVE RESIST MATERIAL, AND PROCESS FOR ITS USE IN PATTERNING SUBSTRATES | Hughes Aircraft Company (US) | 1993-09-15 | — | — | EP | claimed |
| US-5118430-A | Polar phenoplast of the resol type and a copolymer crosslinkable with resols | E. I. DU PONT DE NEMOURS AND COMPANY | 1992-06-02 | — | — | US | claimed |
| EP-0179921-B1 | BASE MATERIAL HAVING A DYED SURFACE FILM AND DYEING METHOD | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1990-08-08 | — | — | EP | claimed |
| EP-0334906-A1 | SILICON-CONTAINING NEGATIVE RESIST MATERIAL, AND PROCESS FOR ITS USE IN PATTERNING SUBSTRATES. | HUGHES AIRCRAFT CO (US) | 1989-10-04 | — | — | EP | claimed |
| US-4824929-A | Polymeric antioxidant and process for production thereof | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1989-04-25 | — | — | US | claimed |
| WO-1988009527-A2 | SILICON-CONTAINING NEGATIVE RESIST MATERIAL, AND PROCESS FOR ITS USE IN PATTERNING SUBSTRATES | HUGHES AIRCRAFT COMPANY (US) | 1988-12-01 | — | — | WO | claimed |
| US-4756989-A | Aluminum or silicon substrate, copolymer resist layer comprising vinyl aromatic, ethylenically unsaturated units | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1988-07-12 | — | — | US | claimed |
| EP-0179921-A1 | BASE MATERIAL HAVING A DYED SURFACE FILM AND DYEING METHOD | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1986-05-07 | — | — | EP | claimed |
| US-4430445-A | POLYAMIDINE HOHO- AND COPOLYMERS; OXIDATION RESISTANCE; METAL EXTRACTION; POLYEPOXIDE CURING AGENTS | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1984-02-07 | — | — | US | claimed |
| US-4074035-A | ISOBUTYLENE AND PARA AND META CHLOROMETHYL STYRENE | EXXON RESEARCH & ENGINEERING CO. (US) | 1978-02-14 | — | — | US | claimed |