SCHEMBL4965451

SCHEMBL4965451

Nc1c(Oc2cccc(-c3ccccc3)c2N)cccc1-c1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NCOA1 Q15788 1/20 0.53
NCOA3 Q9Y6Q9 1/20 0.53
ALDH1A1 P00352 3/20 0.48
HSD17B10 Q99714 3/20 0.48
MAPK1 P28482 2/20 0.44
TP53 P04637 1/20 0.44
RAB9A P51151 1/20 0.44
MAPT P10636 1/20 0.41
MAP4K4 O95819 1/20 0.39
CSF1R P07333 1/20 0.39
FGFR1 P11362 1/20 0.39
PDGFRA P16234 1/20 0.39
LTK P29376 1/20 0.39
KDR P35968 1/20 0.39
MAPK8 P45983 1/20 0.39
CSNK1A1 P48729 1/20 0.39
LIMK1 P53667 1/20 0.39
CDK5 Q00535 1/20 0.39
ACVR1 Q04771 1/20 0.39
TNK2 Q07912 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3792074 0.90 NCOA1 (0.62) NCOA1NCOA3ALDH1A1HSD17B10MAPK1
SCHEMBL25135230 0.85 NCOA1 (0.77) NCOA1NCOA3ALDH1A1HSD17B10MAPK1
SCHEMBL3386558 0.84 NCOA1 (0.56) NCOA1NCOA3ALDH1A1HSD17B10MAPK1
SCHEMBL3252192 0.83 ALDH1A1 (0.48) NCOA1NCOA3ALDH1A1HSD17B10MAPK1
SCHEMBL29634473 0.83 ALDH1A1 (0.48) NCOA1NCOA3ALDH1A1HSD17B10MAPK1
SCHEMBL8206440 0.83 NCOA1 (0.44) NCOA1NCOA3ALDH1A1HSD17B10MAPK1
SCHEMBL25135238 0.82 MAOB (0.58) NCOA1NCOA3ALDH1A1HSD17B10TP53
SCHEMBL28039457 0.81 NCOA1 (0.53) NCOA1NCOA3ALDH1A1HSD17B10MAPK1
SCHEMBL3783536 0.81 NCOA1 (0.67) NCOA1NCOA3ALDH1A1HSD17B10RAB9A
SCHEMBL28039705 0.81 NCOA1 (0.53) NCOA1NCOA3ALDH1A1HSD17B10MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1321487-B1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE MITSUI CHEMICALS INC (JP) 2008-02-27 EP disclosed
US-6710160-B2 VARNISH HAVING IMPROVED SMOOTHNESS, THERMAL RESISTANCE, MELT FLOWABILITY, OPTICAL PROPERTIES AND CHEMICAL RESISTANCE; DIELECTRICS MITSUI CHEMICALS, INC. (JP) 2004-03-23 US disclosed
EP-1321487-A1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE Mitsui Chemicals, Inc. (JP) 2003-06-25 EP disclosed
US-20020188090-A1 Polyamic acid, polyimide, process for producing these, and film of the polyimide MITSUI CHEMICALS, INC. (JP) 2002-12-12 US disclosed