Methacrylic Acid

Methacrylic Acid

SCHEMBL496648

C=C(C)C(=O)O.COCC(O)COC(C)CO

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.33
TGFBR1 P36897 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL8851092 0.97 TSHR (0.32) TSHR
Methacrylic Acid SCHEMBL11112602 0.97 TSHR (0.32) TSHR
Methacrylic Acid SCHEMBL3408561 0.97 TSHR (0.32) TSHR
Methacrylic Acid SCHEMBL11754766 0.97 TSHR (0.32) TSHR
Methacrylic Acid SCHEMBL8850388 0.97 TSHR (0.32) TSHR
Methacrylic Acid SCHEMBL11755409 0.97 TSHR (0.32) TSHR
Methacrylic Acid SCHEMBL8850536 0.97 TSHR (0.32) TSHR
Methacrylic Acid SCHEMBL6272319 0.90
Methacrylic Acid SCHEMBL11240656 0.86 TDP1 (0.46) TSHR
Methacrylic Acid SCHEMBL14053646 0.85 TSHR (0.34) TSHRTGFBR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 270 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250129391-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 US claimed
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 WO claimed
CN-115124889-A Red color paste for color photoresist and preparation method thereof 山东凯瑞尔光电科技有限公司 2022-09-30 CN claimed
CN-109689815-B Heat-curable conductive adhesive 三键有限公司 2022-06-14 CN claimed
US-8904930-B2 Flexographic printing original plate capable of being laser-engraved TOYO BOSEKI KABUSHIKI KAISHA (JP) 2014-12-09 US claimed
US-12606740-B2 Formulations and applications thereof in optoelectronic field ZHEJIANG BRILLIANT OPTOELECTRONIC TECHNOLOGY CO., LTD. (CN) 2026-04-21 US disclosed
US-12534480-B2 Organic compounds and applications thereof in optoelectronic field ZHEJIANG BRILLIANT OPTOELECTRONIC TECHNOLOGY CO., LTD. (CN) 2026-01-27 US disclosed
US-20250280696-A1 FORMULATIONS AND USES THEREOF IN OPTOELECTRONIC FIELD Zhejiang Brilliant Optoelectronic Technology Co.,Ltd. (CN) 2025-09-04 US disclosed
US-20250270445-A1 COMPOUNDS AND USES THEREOF IN FIELD OF OPTOELECTRONICS Zhejiang Brilliant Optoelectronic Technology Co.,Ltd. (CN) 2025-08-28 US disclosed
US-20250275471-A1 BENZOPHENANTHRENE-CONTAINING ORGANIC COMPOUNDS AND USES THEREOF IN ORGANIC OPTOELECTRONIC DEVICES Zhejiang Brilliant Optoelectronic Technology Co.,Ltd. (CN) 2025-08-28 US disclosed
US-12393130-B2 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2025-08-19 US disclosed
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 WO disclosed
EP-0866367-A2 Radiation sensitive composition JSR Corporation (JP) 1998-09-23 EP disclosed
EP-0573933-B1 Image forming method CANON KK (JP) 1997-09-03 EP disclosed
US-5300535-A Polymerization in presence of low viscosity compound, having addition-polymerizable unsaturated group, with polyoxyalkylene polyol ASAHI GLASS COMPANY LTD. (JP) 1994-04-05 US disclosed
EP-0573933-A1 Image forming method CANON KABUSHIKI KAISHA (JP) 1993-12-15 EP disclosed
EP-0443614-A2 Method for producing polyurethane flexible foam ASAHI GLASS COMPANY LTD. (JP) 1991-08-28 EP disclosed
US-4985328-A Metal Complex Charge Control Agents HITACHI CHEMICAL CO., LTD. (JP) 1991-01-15 US disclosed
EP-0360617-A2 Dry toner, dry developer and process for forming images Hitachi Chemical Co., Ltd. (JP) 1990-03-28 EP disclosed
US-4910114-A High molecular weight addition polymer HITACHI CHEMICAL COMPANY, LTD. (JP) 1990-03-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250280696-A1 FORMULATIONS AND USES THEREOF IN OPTOELECTRONIC FIELD CYP2C19, CYP2C9, ALDH1A2 TSHR 3895/4885TGFBR1 3334/4885
US-20250270445-A1 COMPOUNDS AND USES THEREOF IN FIELD OF OPTOELECTRONICS CRY1, ALDH1A2, CYBA TSHR 4475/4885TGFBR1 1641/4885
US-12534480-B2 Organic compounds and applications thereof in optoelectronic field OR10J3, CCR9, NAF1 TSHR 1758/4885TGFBR1 454/4885
US-20250275471-A1 BENZOPHENANTHRENE-CONTAINING ORGANIC COMPOUNDS AND USES THEREOF IN ORGANIC OPTOELECTRONIC DEVICES TYR, DDT, CYP2C9 TSHR 4765/4885TGFBR1 1959/4885
US-12606740-B2 Formulations and applications thereof in optoelectronic field OR10J3, CCR9, CBR1 TSHR 1468/4885TGFBR1 98/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.