⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28778486 | 0.87 | FDPS (0.36) | — | |
| SCHEMBL603147 | 0.86 | — | — | |
| SCHEMBL2884594 | 0.83 | — | — | |
| SCHEMBL190040 | 0.81 | DNM1 (0.38) | — | |
| SCHEMBL2349164 | 0.79 | FDPS (0.39) | — | |
| SCHEMBL24497 | 0.77 | — | — | |
| SCHEMBL23716824 | 0.74 | GGPS1 (0.52) | — | |
| SCHEMBL4655895 | 0.74 | GGPS1 (0.52) | — | |
| SCHEMBL2346919 | 0.74 | GGPS1 (0.52) | — | |
| SCHEMBL1678345 | 0.72 | FDPS (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118239965-A | Polycyclic aromatic compound, polymer thereof, material for organic device, use of the same, organic electroluminescent element, and use of the same | 国立大学法人京都大学 | 2024-06-25 | — | — | CN | disclosed |
| CN-117903181-A | Polycyclic aromatic compound, polymer thereof, material for organic device, use of the same, organic electroluminescent element, and use of the same | 国立大学法人京都大学 | 2024-04-19 | — | — | CN | disclosed |
| US-20240124810-A1 | SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2024-04-18 | — | — | US | disclosed |
| CN-117778117-A | Surface treatment composition, surface treatment method, and method for manufacturing semiconductor substrate | 福吉米株式会社 | 2024-03-29 | — | — | CN | disclosed |
| CN-117430625-A | Polycyclic aromatic compound, polymer thereof, material for organic device, use of the same, organic electroluminescent element, and use of the same | 学校法人关西学院 | 2024-01-23 | — | — | CN | disclosed |
| WO-2023234425-A1 | AMINO ACID ACTIVE ESTER AND SALT THEREOF | ペプチドリーム株式会社 | 2023-12-07 | — | — | WO | disclosed |
| CN-116891789-A | Surface treatment composition, surface treatment method, and method for manufacturing semiconductor substrate | 福吉米株式会社 | 2023-10-17 | — | — | CN | disclosed |
| CN-116891684-A | Surface treatment composition | 福吉米株式会社 | 2023-10-17 | — | — | CN | disclosed |
| CN-116891685-A | Surface treatment composition, surface treatment method, and method for manufacturing semiconductor substrate | 福吉米株式会社 | 2023-10-17 | — | — | CN | disclosed |
| CN-116891723-A | Polishing composition, polishing method, and method for producing semiconductor substrate | 福吉米株式会社 | 2023-10-17 | — | — | CN | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |
| US-6048587-A | POLYBUTADIEBE BACKBONE HAVING ACRYLATE OR VINYL ETHER SUBSTITUENTS AND AN IONICALLY BONDED NEUTRALIZING AGENT SUCH AS AN AMINOACRYLATE, RESISTANT TO MOST SOLVENTS, | RICON RESINS, INC. (US) | 2000-04-11 | — | — | US | disclosed |
| EP-0963972-A2 | Stereoselective reduction of carbonyl compounds | F. HOFFMANN-LA ROCHE AG (CH) | 1999-12-15 | — | — | EP | disclosed |
| CN-1238327-A | Stereoselective reduction of carbonyl compounds | HOFFMANN LA ROCHE (CH) | 1999-12-15 | — | — | CN | disclosed |
| US-5990172-A | Peptidomimetics for the treatment of HIV infection | INNAPHARMA, INC. (US) | 1999-11-23 | — | — | US | disclosed |
| WO-1997031628-A1 | PEPTIDOMIMETICS FOR THE TREATMENT OF HIV INFECTION | INNAPHARMA, INC. (US) | 1997-09-04 | — | — | WO | disclosed |
| EP-0504812-B1 | Aromatic compounds, their production processes and their compositions for the control of insect pests | SUMITOMO CHEMICAL CO (JP) | 1995-09-06 | — | — | EP | disclosed |
| US-5302619-A | Aromatic compounds, their production processes and their compositions for the control of insect pests | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-04-12 | — | — | US | disclosed |
| US-5262441-A | APPLYING INSECTICIDE TO INSECT OR LOCUS WHERE INSECT PROPAGATES | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1993-11-16 | — | — | US | disclosed |
| EP-0504812-A2 | Aromatic compounds, their production processes and their compositions for the control of insect pests | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-09-23 | — | — | EP | disclosed |