Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.52 |
| ▸ | CES2 | O00748 | 2/20 | 0.45 |
| ▸ | CES1 | P23141 | 2/20 | 0.45 |
| ▸ | ESR1 | P03372 | 3/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.41 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.41 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.41 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.41 |
| ▸ | MAOA | P21397 | 2/20 | 0.39 |
| ▸ | MAOB | P27338 | 2/20 | 0.39 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.38 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL515423 | 0.83 | ATM (0.48) | ATMCES2CES1ESR1ESR2 | |
| SCHEMBL6027480 | 0.83 | ATM (0.48) | ATMCES2CES1ESR1ESR2 | |
| SCHEMBL515424 | 0.83 | ATM (0.48) | ATMCES2CES1ESR1ESR2 | |
| SCHEMBL8059220 | 0.80 | ATM (0.42) | ATMCES2CES1ESR1ESR2 | |
| SCHEMBL17188465 | 0.79 | ATM (0.45) | ATMCES2CES1ESR1ESR2 | |
| SCHEMBL16787362 | 0.79 | ATM (0.45) | ATMCES2CES1ESR1ESR2 | |
| SCHEMBL3962527 | 0.79 | ATM (0.45) | ATMCES2CES1ESR1ESR2 | |
| SCHEMBL17188467 | 0.79 | MAOA (0.57) | ATMCES2CES1ESR1ESR2 | |
| SCHEMBL22567026 | 0.79 | ATM (0.45) | ATMCES2CES1ESR1ESR2 | |
| SCHEMBL2806416 | 0.79 | ATM (0.45) | ATMCES2CES1ESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 223 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122070516-A | Negative photosensitive composition, photosensitive resist film, method for producing hollow structure, and method for forming pattern | 东京应化工业株式会社 | 2026-05-19 | — | — | CN | disclosed |
| CN-120065622-A | Photosensitive resin composition and method for producing microlens | 东京应化工业株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-119977851-A | Sulfonyl imide salt photoacid generator and application thereof in photoresist | 杭州先研科技有限公司 | 2025-05-13 | — | — | CN | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-114503030-B | Negative photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, manufacturing method, and roll | 东京应化工业株式会社 | 2025-03-11 | — | — | CN | disclosed |
| CN-119511633-A | Photosensitive resin composition and preparation method and application thereof | 广东聚石科技研究院有限公司 | 2025-02-25 | — | — | CN | disclosed |
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118829948-A | Method for manufacturing plating shaped article | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118742854-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-10-01 | — | — | CN | disclosed |
| CN-118642327-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-09-13 | — | — | CN | disclosed |
| US-5246507-A | Hydroxystyrene polymer and metal ion | KAO CORPORATION (JP) | 1993-09-21 | — | — | US | disclosed |
| US-5188866-A | Recording coating of ferromagnetic metal and polymer; corrosion resistance | KAO CORPORATION (JP) | 1993-02-23 | — | — | US | disclosed |
| US-5158708-A | Binder of polyhydroxystyrene derivative and thermosetting resins | KAO CORPORATION (JP) | 1992-10-27 | — | — | US | disclosed |
| US-5156771-A | Comprising a metal powder, a binder of a homo- or copolymer of a substituted hydroxystyrene and a solvent; printed circuits; noise shield; durability; adhesion | KAO CORPORATION (JP) | 1992-10-20 | — | — | US | disclosed |
| US-5080982-A | Magnetic recording medium | KAO CORPORATION (JP) | 1992-01-14 | — | — | US | disclosed |
| EP-0430277-A1 | Conductive paste and conductive coating film | Kao Corporation (JP) | 1991-06-05 | — | — | EP | disclosed |
| US-4978399-A | Plating or painting pretreatment with an ionized metal compound and a hydroxystyrenesulfonate polymer; coroosion resistance; adhesion | KAO CORPORATION (JP) | 1990-12-18 | — | — | US | disclosed |
| EP-0400642-A2 | Electrically conductive paste composition | KAO CORPORATION (JP) | 1990-12-05 | — | — | EP | disclosed |
| EP-0304377-A2 | Polymers derived from polystyrenes and cross-linked dextranes, their preparation and their use in the analysis and the purification of biologic molecules | THERAPEUTIQUES SUBSTITUTIVES Groupement d'Intérêt Public (FR) | 1989-02-22 | — | — | EP | disclosed |
| EP-0153692-A2 | Method for isomerization a glycidate derivative | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1985-09-04 | — | — | EP | disclosed |