Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.52 |
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | CASP1 | P29466 | 1/20 | 0.36 |
| ▸ | CASP7 | P55210 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20210641 | 0.86 | LMNA (0.59) | LMNATSHRMAPTALDH1A1ALOX15 | |
| SCHEMBL20210551 | 0.85 | LMNA (0.62) | LMNATSHRMAPTALDH1A1ALOX15 | |
| SCHEMBL27842524 | 0.84 | LMNA (0.43) | LMNATSHRMAPTALDH1A1HTT | |
| SCHEMBL20210508 | 0.83 | LMNA (0.66) | LMNATSHRMAPTALDH1A1MAPK1 | |
| SCHEMBL72471 | 0.82 | LMNA (0.62) | LMNATSHRMAPTALDH1A1HTT | |
| SCHEMBL7741371 | 0.81 | LMNA (0.52) | LMNATSHRMAPTALDH1A1HTT | |
| SCHEMBL14174584 | 0.80 | LMNA (0.34) | LMNATSHRMAPTALDH1A1MAPK1 | |
| SCHEMBL1930749 | 0.80 | EPHX2 (0.38) | LMNATSHRMAPTALDH1A1MAPK1 | |
| SCHEMBL27423870 | 0.80 | EPHX2 (0.38) | LMNATSHRMAPTALDH1A1MAPK1 | |
| SCHEMBL17909398 | 0.80 | LMNA (0.52) | LMNATSHRMAPTALDH1A1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3394017-A1 | METHOD FOR PREPARING 2,3,3,3-TETRAFLUORO-1-PROPENE AND RECYCLING 2-CHLORO-3,3,3-TRIFLUOROPROPENE FREE OF IMPURITIES | Arkema France (FR) | 2018-10-31 | — | — | EP | claimed |
| WO-2017108518-A1 | METHOD FOR PREPARING 2,3,3,3-TETRAFLUORO-1-PROPENE AND RECYCLING 2-CHLORO-3,3,3-TRIFLUOROPROPENE FREE OF IMPURITIES | ARKEMA FRANCE (FR) | 2017-06-29 | — | — | WO | claimed |
| US-20240199913-A1 | METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-113462278-B | Varnish composition, method for producing polyimide resin, and additive | 东京应化工业株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-113462277-B | Varnish composition and method for producing polyimide resin | 东京应化工业株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-110776738-B | Composition, cured product, method for producing cured product, salt, and use thereof | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| US-11773287-B2 | Method for forming coating | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| CN-110875172-B | Substrate processing method and method for manufacturing semiconductor device | 铠侠股份有限公司 | 2023-09-15 | — | — | CN | disclosed |
| CN-116333585-A | Varnish composition, method for producing varnish composition, and method for producing polyimide resin | 东京应化工业株式会社 | 2023-06-27 | — | — | CN | disclosed |
| CN-116254048-A | Varnish composition, method for producing varnish composition, and method for producing polyimide resin | 东京应化工业株式会社 | 2023-06-13 | — | — | CN | disclosed |
| CN-116254047-A | Varnish composition, method for producing varnish composition, and method for producing polyimide resin | 东京应化工业株式会社 | 2023-06-13 | — | — | CN | disclosed |
| US-6368195-B1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-04-09 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6126513-A | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-10-03 | — | — | US | disclosed |
| US-6071673-A | Method for the formation of resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-06 | — | — | US | disclosed |
| US-6054545-A | CELLULOSE MODIFIED WITH CARBOXYLATED ISOCYANATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-04-25 | — | — | US | disclosed |
| EP-0894808-A1 | Modified cellulose compound and photopolymerizable resin composition containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-02-03 | — | — | EP | disclosed |
| EP-0890417-A1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-13 | — | — | EP | disclosed |
| US-4978754-A | REACTING B-ALKOXY-SUBSTITUTED CARBOXYLATE WITH CYCLIC AMINE, REMOVING ALCOHOL IN PRESENCE OF BASIC CATALYST | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1990-12-18 | — | — | US | disclosed |
| EP-0321256-A2 | Process of preparing unsaturated carboxylic acid amides | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-06-21 | — | — | EP | disclosed |