SCHEMBL1930749

SCHEMBL1930749

CCC(C)OC(=O)CCOC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.38
LMNA P02545 3/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA3 P07451 1/20 0.38
CA4 P22748 1/20 0.38
CA6 P23280 1/20 0.38
CA5A P35218 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38
CA13 Q8N1Q1 1/20 0.38
CA14 Q9ULX7 1/20 0.38
CA5B Q9Y2D0 1/20 0.38
MAPT P10636 2/20 0.36
MAPK1 P28482 1/20 0.36
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.32
PRKCA P17252 1/20 0.32
PRKCE Q02156 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27423870 1.00 EPHX2 (0.38) EPHX2LMNACA12CA1CA2
SCHEMBL19821871 0.88 LMNA (0.44) EPHX2LMNACA12CA1CA2
SCHEMBL26032629 0.85 DGKA (0.40) EPHX2LMNACA12CA1CA2
SCHEMBL645070 0.84 CA12 (0.45) EPHX2LMNACA12CA1CA2
SCHEMBL16467127 0.83 EPHX2 (0.38) EPHX2LMNACA12CA1CA2
SCHEMBL19821825 0.81 TSHR (0.56) EPHX2LMNACA12CA1CA2
SCHEMBL10554751 0.80 LMNA (0.57) EPHX2LMNACA12CA1CA2
SCHEMBL6231000 0.80 LMNA (0.52) EPHX2LMNACA12CA1CA2
SCHEMBL1585214 0.80 ALDH1A1 (0.50) EPHX2LMNACA12CA1CA2
SCHEMBL2980900 0.80 ALDH1A1 (0.50) EPHX2LMNACA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11773266-B2 Polymer, molded body, foam, resin composition, and production method for polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-03 US disclosed
US-20230129965-A1 HYDROPHILIC AND OLEOPHOBIC POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-04-27 US disclosed
US-20180030175-A1 POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-02-01 US disclosed
US-7955770-B2 surface protection layer comprising a cured fluoropolymer containing fluorinated alkyl group-(meth)acrylate and a photopolymerization initiator; prevent a liquid developing agent from adhering to the undeveloped area; water- and oil-repellency, scratch resistance, anti-fouling SEIKO EPSON CORPORATION (JP) 2011-06-07 US disclosed
US-20080220354-A1 Photoconductor, Photoconductor Cartridge and Image-Forming Apparatus SEIKO EPSON CORPORATION (JP) 2008-09-11 US disclosed