SCHEMBL4989992

SCHEMBL4989992

CC[Si](O)(CC)C(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL10550372 0.97 ALDH1A1 (0.32) ALDH1A1
SCHEMBL9819169 0.84
SCHEMBL5005255 0.71
SCHEMBL9745474 0.71
SCHEMBL2016754 0.69 ALDH1A1 (0.33) ALDH1A1
SCHEMBL2016751 0.69 ALDH1A1 (0.33) ALDH1A1
Amylene Hydrate SCHEMBL9646053 0.64 TSHR (0.47) ALDH1A1
Amylene Hydrate SCHEMBL11481292 0.64 TSHR (0.47) ALDH1A1
SCHEMBL32690762 0.64 ALDH1A1 (0.33) ALDH1A1
SCHEMBL838299 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7413775-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2008-08-19 US disclosed
US-7160625-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2007-01-09 US disclosed
US-20060127683-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2006-06-15 US disclosed
US-20030180550-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2003-09-25 US disclosed
US-6344579-B1 REACTION OF FLUOROSILICON COMPOUND WITH REACTION OF SILICON WITH HYDROXY, ALKOXY OR ARYLOXY GROUP WITH DIFLUORODIAMINO COMPOUND MITSUI CHEMICALS, INC. (JP) 2002-02-05 US disclosed
US-6326369-B1 ALZHEIMER'S DISEASE TAKEDA CHEMICALS INDUSTRIES, LTD. (JP) 2001-12-04 US disclosed
EP-1138633-A1 PROCESS FOR PRODUCING FLUORINATED SILICON COMPOUND Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed
EP-0968164-A1 BICYCLIC QUINONE COMPOUNDS, THEIR PRODUCTION AND USE Takeda Chemical Industries, Ltd. (JP) 2000-01-05 EP disclosed
WO-1998033758-A1 BICYCLIC QUINONE COMPOUNDS, THEIR PRODUCTION AND USE TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1998-08-06 WO disclosed
US-4937331-A Chemical intermediates for antibiotics PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 1990-06-26 US disclosed
EP-0334593-A1 Chiral azetidinone epoxides THE PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 1989-09-27 EP disclosed
EP-0223397-A2 Process for 2-(1-oxo-3-thiolanyl)-2-penem antibiotics PFIZER INC. (US) 1987-05-27 EP disclosed