P-Cresol

P-Cresol

SCHEMBL4992489

C=O.Cc1ccc(C)c(O)c1.Cc1ccc(O)cc1.Cc1cccc(O)c1

nearest known ligand 0.71

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.71
CYP2C19 P33261 1/20 0.71
ACHE P22303 2/20 0.57
TP53 P04637 2/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
TRPA1 O75762 1/20 0.39
ALDH1A1 P00352 1/20 0.39
GAA P10253 1/20 0.39
TSHR P16473 1/20 0.39
ESR1 P03372 2/20 0.38
ESR2 Q92731 2/20 0.38
TDP1 Q9NUW8 1/20 0.38
HSD17B1 P14061 4/20 0.38
HSD17B2 P37059 3/20 0.38
NLRP3 Q96P20 1/20 0.37
RAPGEF4 Q8WZA2 1/20 0.37
ANPEP P15144 1/20 0.36
DPP4 P27487 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
P-Cresol SCHEMBL8640938 0.89 ACHE (0.71) CYP1A2CYP2C19ACHETP53NPC1
P-Cresol SCHEMBL8517161 0.86 CYP1A2 (0.69) CYP1A2CYP2C19ACHETP53NPC1
P-Cresol SCHEMBL7263439 0.84 CYP1A2 (0.71) CYP1A2CYP2C19ACHETP53NPC1
P-Cresol SCHEMBL30606768 0.84 ACHE (0.81) CYP1A2CYP2C19ACHETP53NPC1
P-Cresol SCHEMBL5509205 0.84 ACHE (0.81) CYP1A2CYP2C19ACHETP53NPC1
P-Cresol SCHEMBL8642028 0.84 ACHE (0.62) CYP1A2CYP2C19ACHETP53TRPA1
P-Cresol SCHEMBL6243247 0.83 CYP2C19 (1.00) CYP1A2CYP2C19ACHETP53NPC1
P-Cresol SCHEMBL31006310 0.83 CYP2C19 (1.00) CYP1A2CYP2C19ACHETP53NPC1
P-Cresol SCHEMBL29404960 0.83 CYP2C19 (1.00) CYP1A2CYP2C19ACHETP53NPC1
Formaldehyde SCHEMBL11059012 0.82 TRPA1 (0.56) CYP1A2CYP2C19ACHETP53NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10976659-B2 Photoresists comprising novolak resin blends ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2021-04-13 US disclosed
US-20080182204-A1 A photosensitive polymeric diazonaphthoquinone and novolaks containing cresol, benzaldehyde and salicylaldehyde; high dissolution rates and photospeeds; flat panel displays, semiconductors ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-07-31 US disclosed