Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR2 | P34972 | 1/20 | 0.35 |
| ▸ | AR | P10275 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4991289 | 0.99 | CNR2 (0.36) | CNR2ARTHRB | |
| SCHEMBL4993017 | 0.99 | CNR2 (0.36) | CNR2ARTHRB | |
| SCHEMBL4999475 | 0.99 | CNR2 (0.36) | CNR2ARTHRB | |
| SCHEMBL5002265 | 0.97 | AR (0.34) | CNR2ARCYP3A4CYP2C9CYP2C19 | |
| SCHEMBL4996700 | 0.87 | CA1 (0.37) | THRB | |
| SCHEMBL446602 | 0.86 | CA1 (0.38) | — | |
| SCHEMBL4993290 | 0.86 | CA1 (0.36) | THRB | |
| SCHEMBL4994535 | 0.86 | CA1 (0.36) | THRB | |
| SCHEMBL5002070 | 0.86 | CA1 (0.36) | THRB | |
| SCHEMBL445117 | 0.85 | CA1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |