SCHEMBL4993622

SCHEMBL4993622

[SiH3]OC(C1=CC=CC1)(c1ccccc1)c1ccccc1

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.32
KIF11 P52732 1/20 0.32
ALDH1A1 P00352 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1703358 0.82
Hydrochloric Acid SCHEMBL6357843 0.81 MAPK1 (0.31) MAPK1KIF11
SCHEMBL7592398 0.79 MAPK1 (0.36) MAPK1KIF11ALDH1A1ALOX15
SCHEMBL7049970 0.76 KCNN4 (0.31) MAPK1ALDH1A1
SCHEMBL4652614 0.76 TAAR1 (0.33) MAPK1ALDH1A1
SCHEMBL3257736 0.75 KCNN4 (0.33) MAPK1ALDH1A1ALOX15
SCHEMBL49087 0.73 KIF11 (0.44) MAPK1KIF11ALDH1A1ALOX15
SCHEMBL12814997 0.73 ESR1 (0.42) MAPK1ALDH1A1ALOX15
SCHEMBL16459018 0.73 ALDH1A1 (0.42) MAPK1ALDH1A1ALOX15
SCHEMBL7584605 0.73 KCNN4 (0.32) MAPK1ALDH1A1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2584005-B1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF TOSOH CORP (JP) 2018-02-21 EP disclosed
US-8907038-B2 Typical metal containing polysiloxane composition, process for its production, and its uses TOSOH CORPORATION (JP) 2014-12-09 US disclosed
EP-2584005-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF Tosoh Corporation (JP) 2013-04-24 EP disclosed
US-20130090447-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES TOSOH CORPORATION (JP) 2013-04-11 US disclosed
US-7413775-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2008-08-19 US disclosed
US-7160625-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2007-01-09 US disclosed
US-20060127683-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2006-06-15 US disclosed
US-20030180550-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2003-09-25 US disclosed