⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24634233 | 1.00 | — | — | |
| SCHEMBL4993391 | 0.84 | — | — | |
| SCHEMBL22941687 | 0.82 | — | — | |
| Thioglycolic Acid SCHEMBL3081773 | 0.80 | EPHX2 (0.40) | — | |
| SCHEMBL3073869 | 0.80 | MAPT (0.39) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6363765 | 0.77 | CYP1A2 (0.33) | — | |
| SCHEMBL20976427 | 0.75 | ALDH1A1 (0.35) | — | |
| SCHEMBL1155363 | 0.65 | ALDH1A1 (0.33) | — | |
| SCHEMBL3061816 | 0.63 | HPGD (0.38) | — | |
| SCHEMBL4957431 | 0.63 | HPGD (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107428937-A | Thiolation vinyl norbornene composition and its manufacture method | 切弗朗菲利浦化学公司 | 2017-12-01 | — | — | CN | claimed |
| US-20030207049-A1 | Liquid crystal display unit and method for manufacturing the same | NEC CORPORATION | 2003-11-06 | — | — | US | claimed |
| CN-114573744-B | Method for reducing residual styrene-acrylonitrile copolymer resin and application thereof | 万华化学(四川)有限公司 | 2024-02-27 | — | — | CN | disclosed |
| CN-114573744-A | Method for reducing residual styrene-acrylonitrile copolymer resin and application | 万华化学(四川)有限公司 | 2022-06-03 | — | — | CN | disclosed |
| US-20210364915-A1 | CLICK-CHEMISTRY COMPATIBLE STRUCTURES, CLICK-CHEMISTRY FUNCTIONALIZED STRUCTURES, AND MATERIALS AND METHODS FOR MAKING THE SAME | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC | 2021-11-25 | — | — | US | disclosed |
| CN-108495658-B | Hemostatic material | 巴克斯特国际公司 | 2021-09-03 | — | — | CN | disclosed |
| US-10962879-B2 | Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) | 2021-03-30 | — | — | US | disclosed |
| US-10851067-B2 | Kv7 channel activators compositions and methods of use | KNOPP BIOSCIENCES LLC (US) | 2020-12-01 | — | — | US | disclosed |
| US-10732502-B2 | Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) | 2020-08-04 | — | — | US | disclosed |
| US-20190284142-A1 | KV7 CHANNEL ACTIVATORS COMPOSITIONS AND METHODS OF USE | CHANNEL BIOSCIENCES, LLC | 2019-09-19 | — | — | US | disclosed |
| CN-109709770-A | The manufacturing method of resin combination, dry film and manufacturing method, resist film and substrate and plating forming object, sulfhydryl compound | 东京应化工业株式会社 | 2019-05-03 | — | — | CN | disclosed |
| US-7217492-B2 | Onium salt compound and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050053861-A1 | Onium salt compound and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-03-10 | — | — | US | disclosed |
| US-6773767-B2 | UNIT WITHOUT OCCURRENCE OF ABNORMAL ORIENTATION OF LIQUID CRYSTAL MOLECULES AND DETERIORATION OF THE IMAGE QUALITY AND A METHOD FOR MANUFACTURING THE SAME. ABOVE AND BELOW A TFT, LIGHT SHIELDING FILMS ARE DISPOSED AND FURTHER THE RUGGEDNESS | NEC CORPORATION (JP) | 2004-08-10 | — | — | US | disclosed |
| US-20030207049-A1 | Liquid crystal display unit and method for manufacturing the same | NEC CORPORATION | 2003-11-06 | — | — | US | disclosed |
| EP-0828724-A1 | DIARYL-5-OXYGENATED-2-(5H)-FURANONES AS COX-2 INHIBITORS | MERCK FROSST CANADA INC. (CA) | 1998-03-18 | — | — | EP | disclosed |
| WO-1996036623-A1 | DIARYL-5-OXYGENATED-2-(5H)-FURANONES AS COX-2 INHIBITORS | MERCK FROSST CANADA INC. (CA) | 1996-11-21 | — | — | WO | disclosed |
| US-3979369-A | DIENE POLYMER | MONSANTO COMPANY (US) | 1976-09-07 | — | — | US | disclosed |