SCHEMBL4996335

SCHEMBL4996335

CCCCc1ccc2cc([S+]3CCCC3)ccc2c1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA2 P00918 5/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
BCHE P06276 1/20 0.32
CA1 P00915 4/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4993355 0.97 KCNH2 (0.33) CA2BCHE
SCHEMBL4993905 0.96 KCNH2 (0.35) CA2
SCHEMBL4996573 0.96 KCNH2 (0.35) CA2
SCHEMBL4996810 0.96 KCNH2 (0.35) CA2
SCHEMBL4993965 0.86 THRB (0.32)
SCHEMBL446601 0.86 TSHR (0.37) CA2BCHECA1
SCHEMBL4994481 0.85 THRB (0.33)
SCHEMBL4994452 0.85 THRB (0.33)
SCHEMBL4994018 0.85 THRB (0.33)
SCHEMBL445116 0.85 TSHR (0.36) CA2BCHECA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7371503-B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-05-13 US disclosed
US-20060141383-A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions JSR CORPORATION (JP) 2006-06-29 US disclosed
EP-1586570-A1 SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2005-10-19 EP disclosed