Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 6/20 | 0.33 |
| ▸ | PNMT | P11086 | 1/20 | 0.31 |
| ▸ | THRA | P10827 | 1/20 | 0.31 |
| ▸ | KCNH2 | Q12809 | 6/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4994018 | 1.00 | THRB (0.33) | THRBPNMTTHRAKCNH2 | |
| SCHEMBL4994452 | 1.00 | THRB (0.33) | THRBPNMTTHRAKCNH2 | |
| SCHEMBL4993965 | 0.99 | THRB (0.32) | THRBPNMT | |
| SCHEMBL4994083 | 0.89 | CNR2 (0.31) | — | |
| SCHEMBL4993905 | 0.87 | KCNH2 (0.35) | KCNH2 | |
| SCHEMBL4996810 | 0.87 | KCNH2 (0.35) | KCNH2 | |
| SCHEMBL4996573 | 0.87 | KCNH2 (0.35) | KCNH2 | |
| SCHEMBL4993355 | 0.86 | KCNH2 (0.33) | KCNH2 | |
| SCHEMBL4996335 | 0.85 | CA2 (0.32) | — | |
| SCHEMBL5002067 | 0.85 | THRA (0.35) | THRBTHRA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |