SCHEMBL4999770

SCHEMBL4999770

[SiH3]OC(c1ccccc1)(c1ccccc1)C1CCCC1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KEAP1 Q14145 1/20 0.46
NFE2L2 Q16236 1/20 0.46
CHRM3 P20309 10/20 0.37
CHRM2 P08172 6/20 0.37
CYP2D6 P10635 5/20 0.37
CHRM1 P11229 5/20 0.37
KCNH2 Q12809 3/20 0.37
CHRM4 P08173 2/20 0.37
CHRM5 P08912 2/20 0.37
HRH1 P35367 2/20 0.37
GRIN2D O15399 1/20 0.37
GRIN3B O60391 1/20 0.37
GRIN1 Q05586 1/20 0.37
GRIN2A Q12879 1/20 0.37
GRIN2B Q13224 1/20 0.37
GRIN2C Q14957 1/20 0.37
GRIN3A Q8TCU5 1/20 0.37
CYP3A4 P08684 1/20 0.37
TSHR P16473 1/20 0.37
NFKB1 P19838 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1315214 0.98 KEAP1 (0.44) KEAP1NFE2L2CHRM3CHRM2CYP2D6
SCHEMBL1313892 0.80 KEAP1 (0.46) KEAP1NFE2L2CHRM3CHRM2CYP2D6
SCHEMBL2190190 0.73 CYP2D6 (0.57) CYP2D6HRH1CYP3A4TSHRMAPT
SCHEMBL8466351 0.72 CHRM2 (0.43) KEAP1NFE2L2CHRM3CHRM2CYP2D6
SCHEMBL4999651 0.72 CHRM2 (0.44) KEAP1NFE2L2CHRM3CHRM2CYP2D6
SCHEMBL1314097 0.71 CHRM2 (0.43) KEAP1NFE2L2CHRM3CHRM2CYP2D6
SCHEMBL1313865 0.71 CHRM2 (0.47) KEAP1NFE2L2CHRM3CHRM2CYP2D6
SCHEMBL7748980 0.68 KEAP1 (0.50) KEAP1NFE2L2CHRM3CHRM2CYP2D6
SCHEMBL11868460 0.68 KEAP1 (0.50) KEAP1NFE2L2CHRM3CHRM2CYP2D6
SCHEMBL10995009 0.68 KEAP1 (0.50) KEAP1NFE2L2CHRM3CHRM2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2584005-B1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF TOSOH CORP (JP) 2018-02-21 EP disclosed
US-8907038-B2 Typical metal containing polysiloxane composition, process for its production, and its uses TOSOH CORPORATION (JP) 2014-12-09 US disclosed
EP-2584005-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF Tosoh Corporation (JP) 2013-04-24 EP disclosed
US-20130090447-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES TOSOH CORPORATION (JP) 2013-04-11 US disclosed
US-7413775-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2008-08-19 US disclosed
US-7160625-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2007-01-09 US disclosed
US-20060127683-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2006-06-15 US disclosed
US-20030180550-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2003-09-25 US disclosed