Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4999740 | 0.85 | ALDH1A1 (0.31) | ALDH1A1RAB9A | |
| SCHEMBL4999666 | 0.82 | ALDH1A1 (0.32) | ALDH1A1RAB9A | |
| SCHEMBL107667 | 0.82 | ALDH1A1 (0.32) | ALDH1A1RAB9A | |
| SCHEMBL107726 | 0.82 | ALDH1A1 (0.32) | ALDH1A1RAB9A | |
| SCHEMBL3344099 | 0.81 | ALDH1A1 (0.31) | ALDH1A1RAB9A | |
| SCHEMBL28478691 | 0.81 | ALDH1A1 (0.31) | ALDH1A1RAB9A | |
| SCHEMBL28469378 | 0.81 | ALDH1A1 (0.31) | ALDH1A1RAB9A | |
| SCHEMBL5316273 | 0.81 | ALDH1A1 (0.31) | ALDH1A1RAB9A | |
| SCHEMBL28759147 | 0.81 | ALDH1A1 (0.31) | ALDH1A1RAB9A | |
| SCHEMBL28469084 | 0.81 | ALDH1A1 (0.31) | ALDH1A1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2584005-B1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF | TOSOH CORP (JP) | 2018-02-21 | — | — | EP | disclosed |
| CN-102947393-B | Typical metal containing polysiloxane composition, process for production of same, and uses thereof | TOSOH CORP | 2015-03-11 | — | — | CN | disclosed |
| US-8907038-B2 | Typical metal containing polysiloxane composition, process for its production, and its uses | TOSOH CORPORATION (JP) | 2014-12-09 | — | — | US | disclosed |
| EP-2584005-A1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF | Tosoh Corporation (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-20130090447-A1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES | TOSOH CORPORATION (JP) | 2013-04-11 | — | — | US | disclosed |
| CN-102947393-A | Typical metal containing polysiloxane composition, process for production of same, and uses thereof | TOSOH CORP | 2013-02-27 | — | — | CN | disclosed |
| CN-100415752-C | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2008-09-03 | — | — | CN | disclosed |
| US-7413775-B2 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION (JP) | 2008-08-19 | — | — | US | disclosed |
| CN-100335488-C | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2007-09-05 | — | — | CN | disclosed |
| US-7160625-B2 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION (JP) | 2007-01-09 | — | — | US | disclosed |
| CN-1803805-A | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2006-07-19 | — | — | CN | disclosed |
| CN-1793151-A | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2006-06-28 | — | — | CN | disclosed |
| US-20060127683-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2006-06-15 | — | — | US | disclosed |
| US-20030180550-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2003-09-25 | — | — | US | disclosed |