SCHEMBL5000706

SCHEMBL5000706

Nc1cc(C23CC4CC(C2)CC(C25CC6CC(CC(c7ccc(O)c(N)c7)(C6)C2)C5)(C4)C3)ccc1O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.53
KMT2A Q03164 5/20 0.53
POLB P06746 1/20 0.53
GAA P10253 1/20 0.53
GFER P55789 1/20 0.53
ALDH1A1 P00352 3/20 0.48
LMNA P02545 3/20 0.44
PGR P06401 1/20 0.41
GRIN2D O15399 1/20 0.40
GRIN3B O60391 1/20 0.40
GRIN1 Q05586 1/20 0.40
GRIN2A Q12879 1/20 0.40
GRIN2B Q13224 1/20 0.40
GRIN2C Q14957 1/20 0.40
GRIN3A Q8TCU5 1/20 0.40
SPHK2 Q9NRA0 2/20 0.38
SPHK1 Q9NYA1 2/20 0.38
RAD52 P43351 1/20 0.38
HTT P42858 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2708128 0.92 MEN1 (0.57) MEN1KMT2APOLBGAAGFER
SCHEMBL31544676 0.92 MEN1 (0.57) MEN1KMT2APOLBGAAGFER
SCHEMBL1150069 0.85 MEN1 (0.71) MEN1KMT2APOLBGAAGFER
SCHEMBL2710154 0.85 MEN1 (0.71) MEN1KMT2APOLBGAAGFER
SCHEMBL3177338 0.82 MEN1 (0.57) MEN1KMT2APOLBGAAGFER
SCHEMBL2709501 0.80 MEN1 (0.57) MEN1KMT2APOLBGAAGFER
SCHEMBL31544679 0.77 ALDH1A1 (0.47) MEN1KMT2APOLBGAAGFER
SCHEMBL2706961 0.77 ALDH1A1 (0.47) MEN1KMT2APOLBGAAGFER
SCHEMBL4991468 0.77 ALDH1A1 (0.44) MEN1KMT2APOLBGAAGFER
SCHEMBL3848262 0.77 ESR1 (0.52) MEN1KMT2APOLBGAAGFER

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed