Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 1/20 | 0.32 |
| ▸ | MAOA | P21397 | 3/20 | 0.31 |
| ▸ | MAOB | P27338 | 3/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5002235 | 0.99 | MAOA (0.33) | ARMAOAMAOB | |
| SCHEMBL5002043 | 0.85 | CA1 (0.32) | CA1CA2 | |
| SCHEMBL4995389 | 0.85 | — | — | |
| SCHEMBL5001953 | 0.85 | — | — | |
| SCHEMBL4997145 | 0.83 | CA1 (0.31) | CA1CA2 | |
| SCHEMBL4997241 | 0.82 | CA1 (0.34) | CA1CA2 | |
| SCHEMBL4991069 | 0.82 | ABL1 (0.33) | MAOBCA1CA2 | |
| SCHEMBL4995783 | 0.82 | BACE1 (0.32) | CA1CA2 | |
| SCHEMBL4990177 | 0.82 | ABL1 (0.34) | MAOAMAOBCA1CA2 | |
| SCHEMBL4996370 | 0.82 | CA1 (0.32) | CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |